2015
DOI: 10.1021/acs.cgd.5b01525
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Epitaxy of Boron Phosphide on Aluminum Nitride(0001)/Sapphire Substrate

Abstract: The boron phosphide (BP) semiconductor has many remarkable features, including high thermal neutron capture cross section of the 10 B isotope, making it attractive for neutron detection applications. Effective and efficient neutron detection require BP to also have high crystal quality with optimum electrical properties. Here, we present the heteroepitaxial growth of high quality BP films on a superior aluminum nitride(0001)/sapphire substrate by chemical vapor deposition. The effect of process variables on cr… Show more

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Cited by 69 publications
(47 citation statements)
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“…1(a)], belong to the group of III-V semiconductors, having been of great importance for electronic and optoelectronic applications [1][2][3][4][5][6][7][8]. BAs has recently received special attention, as it has been predicted from the first-principles approach to have a remarkably high value of thermal conductivity (κ) at room temperature (2240 W m −1 K −1 ), comparable to that of diamond [9].…”
Section: Introductionmentioning
confidence: 99%
“…1(a)], belong to the group of III-V semiconductors, having been of great importance for electronic and optoelectronic applications [1][2][3][4][5][6][7][8]. BAs has recently received special attention, as it has been predicted from the first-principles approach to have a remarkably high value of thermal conductivity (κ) at room temperature (2240 W m −1 K −1 ), comparable to that of diamond [9].…”
Section: Introductionmentioning
confidence: 99%
“…One of the most common ways to make BP is through bulk synthesis techniques, such as flux growth or solid-state reaction. 30,[76][77][78][79] Thin-film deposition of BP is almost invariably carried out by CVD of some kind, either metal-organic chemical vapor deposition (MOCVD), 73,80,81 or standard CVD, 68,[70][71][72]74,75,[82][83][84][85] or even plasma-enhanced CVD. 86 Other, less common deposition methods include vapor-liquid-solid growth, 87,88 thermal evaporation from powders in vacuum, 89 or sputtering in phosphine/Ar atmosphere.…”
Section: Boron Phosphidementioning
confidence: 99%
“…Boron phosphide was deposited on both the substrates with silicon nitride window and a plain silicon substrate, which served as reference samples for the x-ray absorption spectroscopy measurements. The CVD setup and experimental methods used in this work have been described in greater detail elsewhere [24][25][26]. The precursor gases were ultra-high purity phosphine (99.999 %) and diborane (1 % in H 2 ) in an ultra-high purity hydrogen carrier gas.…”
Section: Sample Depositionmentioning
confidence: 99%