2019
DOI: 10.1016/j.nanoen.2018.11.015
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Epitaxially grown semi-vertical and aligned GaTe two dimensional sheets on ZnO substrate for energy harvesting applications

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Cited by 27 publications
(27 citation statements)
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“…Layered two-dimensional (2D) group III metal chalcogenides (MCs) (GaSe, GaTe, InSe, and others) are still of strong interest for the development of novel high-performance semiconductor devices due to their unique electronic and optical properties [ 1 , 2 , 3 ]. In particular, these materials have attracted great attention for the fabrication of field-effect transistors [ 4 ], solar cells [ 5 , 6 ], high-efficient photodetectors, and gas sensing devices [ 7 , 8 ]. InSe has significant potential for using in thermoelectric applications [ 9 ].…”
Section: Introductionmentioning
confidence: 99%
“…Layered two-dimensional (2D) group III metal chalcogenides (MCs) (GaSe, GaTe, InSe, and others) are still of strong interest for the development of novel high-performance semiconductor devices due to their unique electronic and optical properties [ 1 , 2 , 3 ]. In particular, these materials have attracted great attention for the fabrication of field-effect transistors [ 4 ], solar cells [ 5 , 6 ], high-efficient photodetectors, and gas sensing devices [ 7 , 8 ]. InSe has significant potential for using in thermoelectric applications [ 9 ].…”
Section: Introductionmentioning
confidence: 99%
“…[40][41][42] Wang et al [43] reported the application of multilayer GaTe in phototransistors by calculating the transport properties. Additionally, the 2D GaTe [44] nanosheets prepared by chemical vapor deposition (CVD) growth method can further construct a solar cell based on ZnO substrate, which achieves a conversion efficiency (PCE) of 6.64%. The InSe/GaTe vdW heterobilayer (HBL) [45] can serve as a potential visible-lightdriven photocatalyst for water splitting to produce hydrogen, which notably improves the photocatalytic performance over that of isolated InSe and GaTe monolayers.…”
Section: Introductionmentioning
confidence: 99%
“…We synthesize GaTe nanostructures using a simple PVT process as described in the experimental section. Although most recent studies report the physical-vapor-deposition (PVD) growth of GaTe layer samples using GaTe powder as the precursor [ 20 , 27 , 28 ]. Considering to the high melting point of GaTe (824 °C), using the low melting point materials: gallium (mp: 30 °C) and tellurium (mp: 450 °C) as evaporation source not only provides a steady supply of Ga and Te vapor pressure but also allows the precise morphology control of the growth of GaTe 1D nanowires and 2D nanosheets.…”
Section: Resultsmentioning
confidence: 99%