2002
DOI: 10.1063/1.1481543
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Epitaxial PrBa2(Cu0.8Al0.2)3O7 thin films grown by rf sputtering

Abstract: Epitaxial thin films of PrBa 2 (Cu 0.8 Al 0.2) 3 O 7 have been vacuum deposited by rf sputtering on the LaAlO 3 substrates. Though electrically much more resistive, these Al-substituted films are all of orthorhombic structure and epitaxial quality on various oxide substrates, much like YBa 2 Cu 3 O 7 and PrBa 2 Cu 3 O 7 grown under similar conditions. The samples appeared to be shiny and dark as observed with the naked eye, but their electrical resistivity, (T), ranged from ϳ1 ⍀ cm at room temperature to about… Show more

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