Abstract:We synthesize epitaxial films of SnSe, a van der Waals (vdW) layered semiconductor, on III−V substrates via molecular beam epitaxy. While direct deposition of SnSe on GaAs(001) surfaces results in polycrystalline growth, the structural similarity between the distorted rocksalt SnSe and a rocksalt PbSe interlayer facilitates ordered quasi-vdW epitaxy of SnSe with only discrete in-plane rotations arising from the lower film symmetry. Toward manipulating the layering of SnSe for improved mechanical, optoelectroni… Show more
“…This is a promising development that requires confirmation and validation. Moreover, the epitaxial growth of π-SnSe on PbSe was recently reported. , …”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the epitaxial growth of π-SnSe on PbSe was recently reported. 36,37 Epitaxial growth is commonly expected when the lattice mismatch f between the overgrown film and the substrate (eq 1) is equal or smaller than 15%. (1) Epitaxial growth in the GaAs/PbS substrate/film system is expected considering the f = −5% (compressive) lattice mismatch.…”
Epitaxial growth of the newly discovered metastable cubic tin sulfide (π-SnS) material was studied theoretically and experimentally. Lead sulfide (PbS) substrates possess a small lattice mismatch with π-SnS and are therefore suitable substrates for epitaxial growth. Very recently, epitaxial growth of π-SnS(111) on PbS(111) and π-SnS(110) on PbS(110) was reported. The interfacial energies of π-SnS(111) on PbS(111), as well as π-SnS(100) on PbS(100), were calculated and found to be smaller than their corresponding pristine surface energies, which give rise to the stable epitaxial growth of π-SnS on PbS. Moreover, we experimentally confirmed the epitaxial growth of π-SnS(100) onto PbS(100) as predicted by the theoretical results. These results establish the pathway of epitaxial growth of π-SnS compact thin films in desired orientations and thus bring their applications closer.
“…This is a promising development that requires confirmation and validation. Moreover, the epitaxial growth of π-SnSe on PbSe was recently reported. , …”
Section: Introductionmentioning
confidence: 99%
“…Moreover, the epitaxial growth of π-SnSe on PbSe was recently reported. 36,37 Epitaxial growth is commonly expected when the lattice mismatch f between the overgrown film and the substrate (eq 1) is equal or smaller than 15%. (1) Epitaxial growth in the GaAs/PbS substrate/film system is expected considering the f = −5% (compressive) lattice mismatch.…”
Epitaxial growth of the newly discovered metastable cubic tin sulfide (π-SnS) material was studied theoretically and experimentally. Lead sulfide (PbS) substrates possess a small lattice mismatch with π-SnS and are therefore suitable substrates for epitaxial growth. Very recently, epitaxial growth of π-SnS(111) on PbS(111) and π-SnS(110) on PbS(110) was reported. The interfacial energies of π-SnS(111) on PbS(111), as well as π-SnS(100) on PbS(100), were calculated and found to be smaller than their corresponding pristine surface energies, which give rise to the stable epitaxial growth of π-SnS on PbS. Moreover, we experimentally confirmed the epitaxial growth of π-SnS(100) onto PbS(100) as predicted by the theoretical results. These results establish the pathway of epitaxial growth of π-SnS compact thin films in desired orientations and thus bring their applications closer.
“…Thermoelectric (TE) materials are regarded as the most promising new clean energy sources, which can effectively ameliorate the greenhouse effect and the earth’s environment. − The conversion between heat energy and electric energy can be realized directly through thermoelectric materials , that do not release any hazardous gaseous chemical residues. , The thermoelectric component is a mechanically reliable, stable environment of the electric device, with no operating mechanical vibration and noise. , To apply thermoelectric materials in the future, the key problem is improving the conversion efficiency. The thermoelectric properties are determined by a dimensionless figure of merit ( ZT ), which is defined as ZT = S 2 σ T /κ t , where S is the Seebeck coefficient, σ is the electrical conductivity, S 2 σ is the power factor (PF), T is the absolute temperature, and κ t is the total thermal conductivity, which consists of the lattice thermal conductivity (κ l ) and the electron thermal conductivity (κ e ) …”
Section: Introductionmentioning
confidence: 99%
“…1−4 The conversion between heat energy and electric energy can be realized directly through thermoelectric materials 5,6 that do not release any hazardous gaseous chemical residues. 7,8 The thermoelectric component is a mechanically reliable, stable environment of the electric device, with no operating mechanical vibration and noise. 9,10 To apply thermoelectric materials in the future, the key problem is improving the conversion efficiency.…”
Tin selenide (SnSe) with low thermal conductivity has
been widely
studied in the last few years because it is most promising for further
thermoelectric applications. The low electrical conductivity is the
main problem that limits the improvement of its thermoelectric properties.
The SnSe1–x
S
x
(x = 0, 0.1, 0.3, and 0.5) bulk samples were
synthesized by the hydrothermal method, followed by spark plasma sintering.
The thermal conductivity of SnSe was tuned and reduced at various
temperature ranges by adjusting the amount of S added, and the low
κ
t
of 0.26 W·m–1·K–1 for the SnSe0.5S0.5 sample was obtained at 773 K due to the S alloying and nanostructure.
The peak power factor of 437 μW·m–1·K–2 for the SnSe0.7S0.3 sample
was gained at 773 K. Consequently, a peak ZT value
of 1.2 for the SnSe0.7S0.3 sample at 773 K was
obtained, which is approximately three times that of the pure sample.
The results demonstrate that S alloying can effectively improve the
thermoelectric properties of SnSe materials at various temperatures.
“…To realize and eventually to manufacture future nanodevices that take advantage of the large in-plane anisotropy of α-SnSe, it is important to control 90° ferroelastic domains (i.e., twins) during thin-film synthesis. To date, all reports of epitaxial thin-film synthesis of α-SnSe showed large density 90° domain boundaries (similar challenges are faced with transition-metal dichalcogenides, which grow as epitaxial thin films with a large density of 60° twin boundaries). ,− Since α-SnSe is a van der Waals (vdW) material, substrate–film interactions are often assumed to be weak, compared to conventional heteroepitaxial growth featuring covalent interface bonding . Even so, it has been shown that substrate–film symmetry and lattice matching can reduce the density of twin boundaries in thin films of materials grown by vdW epitaxy .…”
van
der Waals (vdW) layered chalcogenides have strongly direction-dependent
(i.e., anisotropic) properties that make them interesting for photonic
and optoelectronic applications. Orthorhombic tin selenide (α-SnSe)
is a triaxial vdW material with strong optical anisotropy within layer
planes, which has motivated studies of optical phase and domain switching.
As with every vdW material, controlling the orientation of crystal
domains during growth is key to reliably making wafer-scale, high-quality
thin films, free from twin boundaries. Here, we demonstrate a fast
optical method to quantify domain orientation in SnSe thin films made
by molecular beam epitaxy (MBE). The in-plane optical anisotropy results
in white-light being reflected into distinct colors for certain optical
polarization angles and the color depends on domain orientation. We
use our method to confirm a high density of twin boundaries in SnSe
epitaxial films on MgO substrates, with square symmetry that results
in degeneracy between SnSe 90° domain orientations. We then demonstrate
that growing on a-plane sapphire, with rectangular lattice-matched
symmetry that breaks the SnSe domain degeneracy, results in single-crystalline
films with one preferred orientation. Our SnSe
bottom-up film synthesis by MBE enables future applications of this
vdW material that is particularly difficult to process by top-down
methods. Our optical metrology is fast and can apply to all triaxial
vdW materials.
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