2006
DOI: 10.1016/j.physb.2006.01.535
|View full text |Cite
|
Sign up to set email alerts
|

Epitaxial growth of ZnO films by helicon-wave-plasma-assisted sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2007
2007
2011
2011

Publication Types

Select...
2
1

Relationship

0
3

Authors

Journals

citations
Cited by 3 publications
(1 citation statement)
references
References 15 publications
(14 reference statements)
0
1
0
Order By: Relevance
“…Fused quartz has also been used in other large diameter helicon plasma sources [7], and widely used as a gas containment tube material in helicon plasma sources for plasma-assisted coating and sputtering applications [8], (where commonly referred to as a 'discharge tube'). Pyrex ® has also been used as a GCT material in low power helicon plasma sources [9,10].…”
Section: Introductionmentioning
confidence: 99%
“…Fused quartz has also been used in other large diameter helicon plasma sources [7], and widely used as a gas containment tube material in helicon plasma sources for plasma-assisted coating and sputtering applications [8], (where commonly referred to as a 'discharge tube'). Pyrex ® has also been used as a GCT material in low power helicon plasma sources [9,10].…”
Section: Introductionmentioning
confidence: 99%