2021
DOI: 10.1038/s41565-021-00963-8
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Epitaxial growth of wafer-scale molybdenum disulfide semiconductor single crystals on sapphire

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Cited by 477 publications
(441 citation statements)
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References 48 publications
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“…44 Wang et al used an a-Al 2 O 3 (0001) wafer with a miscut angle towards the A-axis to demonstrate wafer-scale single-crystal MoS 2 growth. 41 Contrary to a conventional a-Al 2 O 3 (0001) wafer with predominant h11-20i steps, the proposed miscut approach produced surface steps along with h10-10i, which differentiated nucleation energies for the antiparallel domains and resulted in unidirectional alignment (Fig. 5d and e).…”
Section: Synthesis Of Non-centrosymmetric Wsso 2d Layersmentioning
confidence: 88%
“…44 Wang et al used an a-Al 2 O 3 (0001) wafer with a miscut angle towards the A-axis to demonstrate wafer-scale single-crystal MoS 2 growth. 41 Contrary to a conventional a-Al 2 O 3 (0001) wafer with predominant h11-20i steps, the proposed miscut approach produced surface steps along with h10-10i, which differentiated nucleation energies for the antiparallel domains and resulted in unidirectional alignment (Fig. 5d and e).…”
Section: Synthesis Of Non-centrosymmetric Wsso 2d Layersmentioning
confidence: 88%
“… Wafer-scale growth of 2D TMDC single crystals. The synthesis of large-area TMDC single crystals with unprecedented crystallinity, electrical quality, and wafer-scale uniformity is the ultimate target that will eventually pave the way for 2D TMDC-based electronics ( Li et al, 2021 ; Xu et al, 2021 ). Molten salts such as Na 2 Mo 2 O 7 had been used to achieve ledge-induced epitaxial growth of 1D MoS 2 nanoribbons along with the surface steps of NaCl crystals.…”
Section: Perspectivementioning
confidence: 99%
“…), have attracted considerable attention due to their unique physical and chemical properties, exhibiting promising applications on optoelectronics [1][2][3], valleyelectronics [4] and chemical sensors [5,6]. Both fundamental research and potential applications are highly dependent on the quality of TMD materials [7][8][9][10]. Conventionally, there are two kinds of methods to prepare 2D materials: top-down and bottom-up approaches.…”
Section: Introductionmentioning
confidence: 99%
“…On the other hands, bottom-up synthesis methods (such as intercalation assisted exfoliation [11], physical vapor deposition [12], hydrothermal synthesis [13], and chemical vapor deposition (CVD)) can offer a lateral size of TMD films up to hundreds of micrometers. In particular, CVD has been well-developed to produce large area crystals with controllable thickness and stacking sequences [9,10,14]. As a matter of fact, it is still a challenge to obtain highly uniform TMD materials with high performance on carrier mobility and conductivity with the CVD method.…”
Section: Introductionmentioning
confidence: 99%