2011
DOI: 10.1016/j.tsf.2011.01.343
|View full text |Cite
|
Sign up to set email alerts
|

Epitaxial growth of nonpolar m-plane ZnO (10–10) on large-size LiGaO2 (100) substrates

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
20
0

Year Published

2012
2012
2021
2021

Publication Types

Select...
10

Relationship

1
9

Authors

Journals

citations
Cited by 28 publications
(20 citation statements)
references
References 20 publications
0
20
0
Order By: Relevance
“…β -LiGaO 2 , which possesses a band gap of 5.6 eV, is the best-known wurtzite-derived ternary oxide semiconductor. High purity single crystals several inches long can be grown by the Czochralski method and they can be cleaved to form faces that are lattice-matched to ZnO and GaN [ 30 32 ]. It has been studied as a substrate material for ZnO and GaN and as an insulating layer for epitaxially grown ZnO-based multilayers [ 33 ].…”
Section: β -Ligao 2 and Its Alloys With Zmentioning
confidence: 99%
“…β -LiGaO 2 , which possesses a band gap of 5.6 eV, is the best-known wurtzite-derived ternary oxide semiconductor. High purity single crystals several inches long can be grown by the Czochralski method and they can be cleaved to form faces that are lattice-matched to ZnO and GaN [ 30 32 ]. It has been studied as a substrate material for ZnO and GaN and as an insulating layer for epitaxially grown ZnO-based multilayers [ 33 ].…”
Section: β -Ligao 2 and Its Alloys With Zmentioning
confidence: 99%
“…LiGaO 2 (LGO) (100) and ( 010) substrates have been demonstrated to be suitable for growing nonpolar m-and a-plane ZnO epilayers, respectively [22][23][24]. The lattice mismatch is 1.9% in [1120] LGO, all of which will further decrease at the actual growth temperature of 700°C due to thermal expansion.…”
Section: Introductionmentioning
confidence: 99%
“…19,20 LiGaO 2 (LGO) substrates with (100) or (010) surfaces have a high potential for growing nonpolar GaN [21][22][23][24][25][26][27] and ZnO. [28][29][30][31][32] Different growth techniques, including pulsed laser deposition (PLD), 21,22 molecular beam epitaxy (MBE), 23,24 and chemical vapor deposition (CVD), 25 have been employed to fabricate nonpolar GaN lms and quantum wells. 26 The full width at half maximum (FWHM) of the (10 10) rocking curve and the surface roughness can be as low as 0.1 and 0.9 nm, respectively.…”
Section: Introductionmentioning
confidence: 99%