2007
DOI: 10.1016/j.tsf.2006.10.034
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Epitaxial growth of lithium niobate film using metalorganic chemical vapor deposition

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Cited by 39 publications
(23 citation statements)
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“…Optical waveguides comprised of hetero-materials efficiently confine propagating light because of large difference in refractive indices between the film and the substrate [13]. Therefore, LiNbO3s have been grown by several techniques including liquid-phase epitaxy [14], Ion Beam Sputtering [15], RF magnetron sputtering [16], molecular beam epitaxy [17], metalorganic chemical vapor deposition [18], pulsed-laser deposition (PLD) [19], thermal plasma spray chemical vapor deposition [20], electron-cyclotron-resonance (ECR) plasma sputtering [21], electron beam irradiation [22] and pulsed laser ablation (PLA) [23].…”
Section: Introductionmentioning
confidence: 99%
“…Optical waveguides comprised of hetero-materials efficiently confine propagating light because of large difference in refractive indices between the film and the substrate [13]. Therefore, LiNbO3s have been grown by several techniques including liquid-phase epitaxy [14], Ion Beam Sputtering [15], RF magnetron sputtering [16], molecular beam epitaxy [17], metalorganic chemical vapor deposition [18], pulsed-laser deposition (PLD) [19], thermal plasma spray chemical vapor deposition [20], electron-cyclotron-resonance (ECR) plasma sputtering [21], electron beam irradiation [22] and pulsed laser ablation (PLA) [23].…”
Section: Introductionmentioning
confidence: 99%
“…The first reports on the growth of c ‐axis‐oriented LN films by liquid phase epitaxy on an LT substrate and by RF sputtering on C ‐sapphire substrates appeared in early seventies . Since then these substrates were widely studied for the growth of the Z ‐LN and Z ‐LT films by different methods: LPE, epitaxial growth by melting, RF sputtering pulsed laser deposition (PLD), molecular beam epitaxy (MBE), metal organic, and aqueous precursor solutions, sol–gel, spin coating, microwave oven method, and chemical vapor deposition (CVD) and its derivatives such as thermal plasma CVD, pulsed metal–organic CVD (MOCVD), pulsed‐injection (PI) MOCVD, spray MOCVD, atmospheric pressure aerosol MOCVD, solid source flash evaporation, combinatorial high‐vacuum CVD, atomic layer deposition (ALD), etc. In the following sections, we summarize the problems and the applied strategies for the optimization of growth of high‐quality LN–LT layers.…”
Section: Growth Of Linbo3 and Litao3 Films By Chemical And Physical Mmentioning
confidence: 99%
“…Numerous publications were dedicated to the elimination of the formation of the Li‐poor or Li‐rich secondary phases ((LiNb(Ta) 3 O 8 or Li 3 Nb(Ta)O 4 ) and to optimize the growth of single‐phase LN/LT films. The standard technique used for phase compositional analysis of LN/LT films is X‐ray diffraction (XRD) . In the case of a system containing two phases, the orientation of the inclusions of the secondary phase in the film matrix is defined by the minimum of the interface energy .…”
Section: Growth Of Linbo3 and Litao3 Films By Chemical And Physical Mmentioning
confidence: 99%
“…The mean free path is short so a part of the Li atoms diffuses strongly towards the walls of the deposition chamber by scattering among the gas mixture, instead of being transferred to the substrate. Deposition of nonstoichiometric lithium niobate films is frequently reported in the literature [9,18], and consequently the Li deficiency may be prevented by keeping a low substrate temperature during the process. Moreover, a careful combination of the sputtering parameters, such as gas pressure and gas flow, radio frequency power, etc.…”
Section: Structural Properties Of Linbo 3 /Ncd/si Layersmentioning
confidence: 99%