Epitaxial growth of cerium oxide thin film buffer layers deposited by d.c. magnetron sputtering

Measurement of radiation-enhanced diffusion of La in single crystal thin film CeO2

“…2 demonstrates that the as-grown un-irradiated film consisted of a singledomain. The fourfold symmetry observed from the (2 2 0) in-plane reflection is that expected of single crystal CeO 2 on r-plane sapphire, as observed by others [8,9]. Here it is important to draw a distinction between a highly textured polycrystalline film and a true single crystal film.…”

“…The best-fit of Eq. (9) to the attemperature irradiated diffusivity is shown in Fig. 7 and discussed below.…”

How r-Plane Al2O3 Surface Modifications Impact the Growth of Epitaxial (001) CeO2 Thin Films

“…Technologically, epitaxial (001)-oriented CeO 2 films are important as an effective buffer layer for the subsequent integration of the functional (001)-oriented single-crystal oxides SrRuO 3 , SrTiO 3 , and YBa 2 Cu 3 O 7 onto commercially available large-area epi-ready (001) Si and (102) Al 2 O 3 substrates. [1][2][3][4][5] The unusually large mismatch that would tend to preclude epitaxy of (001) CeO 2 on (102) Al 2 O 3 is due to both the deviation of the (102) Al 2 O 3 surface from true cubic symmetry and the $9% difference in the spacing of atoms between the film and substrate directions that would be parallel if the (102) Al 2 O 3 substrate were to be truly cubic: The ''pseudo-cubic'' (102) Al 2 O 3 surface consists of a net formed by cations separated by $3.498 Å along the two close-packed directions, "…”

Thermochromic CeO2–VO2 bilayers: Role of ceria coating in optical switching properties

“…), microstructural defects, grain sizes and deposition process. By the past, to deposit ceria thin films on substrates, various deposition techniques were extensively used: the RF reactive sputtering [17,18], the chemical vapor deposition [19], the pulsed laser deposition [20,21] and the ''sol-gel'' method for the spin coating deposition [22,23]. Thermochromic VO 2 thin films were deposited on various substrates making use similar approaches: the RF reactive sputtering [24,25], the pulsed laser deposition [26,27], the chemical vapor deposition [28][29][30] and the sol-gel process [31,32].…”