2019
DOI: 10.1038/s41928-019-0314-2
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Epitaxial growth and layer-transfer techniques for heterogeneous integration of materials for electronic and photonic devices

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Cited by 164 publications
(110 citation statements)
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“…Furthermore, although a major technological challenge, transfer of the TMDC films from the growth substrate to the target substrate is actively researched in the 2D community. [ 300,301 ] Nevertheless, even if the transfer process lifts the temperature restrictions, the high‐temperature ALD processes will have to compete with more established (MO)CVD TMDC processes.…”
Section: Applications Of Atomic Layer Deposited 2d Metal Dichalcogenidesmentioning
confidence: 99%
“…Furthermore, although a major technological challenge, transfer of the TMDC films from the growth substrate to the target substrate is actively researched in the 2D community. [ 300,301 ] Nevertheless, even if the transfer process lifts the temperature restrictions, the high‐temperature ALD processes will have to compete with more established (MO)CVD TMDC processes.…”
Section: Applications Of Atomic Layer Deposited 2d Metal Dichalcogenidesmentioning
confidence: 99%
“…[ 13 ] In contrast, a single‐crystalline heterostructure with high crystalline purity and well‐defined interface would overcome these obstacles and exhibit impressive improvements: lower intrinsic carrier concentration, higher carrier mobility, and longer carrier diffusion length. [ 14 ] Such characteristics make these materials an ideal medium for charge transport and realizing high‐performance self‐powered photodetectors. In addition, for commercial applications, large‐sized single‐crystalline heterostructures will further improve their potential for large‐scale optoelectronic integration.…”
Section: Figurementioning
confidence: 99%
“…However, this heterogenous epitaxial thin lm growth limits the applications to the curved and exible thermoelectrics due to the clamping effect, inherited from strong bond between overlayer lm and substrate at interface, of epitaxial thin lms on the at substrate 19,20 . Furthermore, it is extremely di cult to grow high quality epitaxial thin lms on the materials with large lattice mismatch or on the exible matters 21 . These obstacles have been solved by using the exible scaffold materials such as carbon nanotube anchored with highly oriented Bi 2 Te 3 nanocrystals, providing a promising way for practical exible thermoelectric devices 22 .…”
Section: Introductionmentioning
confidence: 99%
“…The naturally-formed pseudomorphic Te monolayer on the sapphire substrate during in-situ spontaneous vdWE growth is of bene t in practical lift-off process in chemical solution, working as a sacri cial layer. Additionally, the sacri cial Te monolayer is expected to have a high etch selectivity, allowing to overcome the well-known shortcoming, a slow release rate 21,26 , of chemical lift-off for larger substrates.…”
Section: Introductionmentioning
confidence: 99%