1992
DOI: 10.1063/1.350642
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Epitaxial growth and characterization of zinc-blende gallium nitride on (001) silicon

Abstract: GaN films have been epitaxially grown onto (001) Si by electron cyclotron resonance microwave-plasma-assisted molecular-beam epitaxy, using a two-step growth process, in which a GaN buffer is grown at relatively low temperatures and the rest of the film is grown at higher temperatures. This method of film growth was shown to lead to good single-crystalline β-GaN and to promote lateral growth resulting in smooth surface morphology. The full width at half-maximum of the x-ray rocking curve in the best case was f… Show more

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Cited by 354 publications
(105 citation statements)
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“…These applications usually require GaN in the wurtzite and zinc blende phases depending on the synthetic techniques (Lei et al, 1992). In addition, GaN is also characterized to have high hardness, low compressibility, high ionicity and high thermal conductivity.…”
Section: Properties Structures and Applications Of Ganmentioning
confidence: 99%
“…These applications usually require GaN in the wurtzite and zinc blende phases depending on the synthetic techniques (Lei et al, 1992). In addition, GaN is also characterized to have high hardness, low compressibility, high ionicity and high thermal conductivity.…”
Section: Properties Structures and Applications Of Ganmentioning
confidence: 99%
“…Different combinations of group III-V elements have produced more than twenty-five (25) III-V compound semiconductors, examples of which are indium nitride (InN), gallium arsenide (GaAs), gallium nitride (GaN), aluminum nitride (AlN). Group IIInitride are now a widely studied class of semiconductor materials, and they have found commercial success in recent twenty years as light emitting diodes and lasers in the green to near-ultraviolet regions of the electromagnetic spectrum [5][6][7][8][9][10][11]. GaN is a very hard material that has a wurtzite crystal structure.…”
Section: Introductionmentioning
confidence: 99%
“…The epitaxy of metastable, cubic GaN on GaAs (001) substrates has attracted some interest recently since c-GaN layers and the GaAs substrate have a common cleavage plane, they are considered to be well suited for the fabrication of laser cavities with cleaved facets [1][2][3][4][5][6][7][8]. [2].…”
Section: Introductionmentioning
confidence: 99%