The focus of studies on ferromagnetic semiconductors is moving from material issues to device functionalities based on novel phenomena often associated with the anisotropy properties of these materials. This is driving a need for a method to locally control the anisotropy in order to allow the elaboration of devices. Here we present a method which provides patterning induced anisotropy which not only can be applied locally, but also dominates over the intrinsic material anisotropy at all temperatures.The coupling of transport and magnetic properties in ferromagnetic semiconductors gives rises to many interesting anisotropy related transport phenomena such as strong anisotropic magnetoresistance (AMR), inplane hall [1], tunneling anisotropic magnetoresistance (TAMR) [2,3] and Coulomb blockade AMR [4]. Studies on all of these effects so far have primarily made use of the intrinsic anisotropy present in the host (Ga,Mn)As layer. Before they can be harnessed to their full potential, a means of engineering the anisotropy locally is needed, such that multiple elements with different anisotropies can be integrated, and their interactions can be properly investigated.One successful approach to local anisotropy control in metallic ferromagnets has been to make use of shape anisotropy. The same approach has been tried in the prototypical ferromagnetic semiconductor (Ga,Mn)As with lackluster results. In Ref. 5, the authors reported the observation of shape induced anisotropy in (Ga,Mn)As wires of 100 nm thickness x 1.5 x 200 µm 2 , but only over a limited temperature range. Moreover, our own experience in attempting to use wires of similar dimensions have yielded sporadic results with the wires having irreproducible anisotropy, with either biaxial or uniaxial easy axes in inconsistent directions.Furthermore, a simple calculation of the expected shape anisotropy term in such wires indicates that it should not play a significant role. While the infinite rod model used in [5] does predict an appreciable shape anisotropy field given by µ 0 M S /2, where M S is the sample magnetization, it is not applicable to structures which are much thinner than their lateral dimensions. A more exact rectangular prism calculation [6] gives a 5 times weaker shape anisotropy with an anisotropy energy density of 80 J/m 3 which is much too small to compete with the typical crystalline anisotropy of 3000 J/m 3 [5,7] in this material.Growth strain reduces the cubic symmetry of the (Ga,Mn)As zinc-blend crystal structure creating a uniaxial anisotropy with an easy/hard magnetic axis in growth direction when the (Ga,Mn)As layer is tensile/compressively strained.This growth strain is known[8] to influence the strength of the perpendicular component of the anisotropy of the whole layer. Here we discuss (Ga,Mn)As grown on a (001) oriented GaAs substrate, whose out-of-plane hard magnetic axis confines the magnetization in the plane. Phenomenologically, the net in-plane magnetic anisotropy is known to result from a competition of two primary contributions...