2022
DOI: 10.1109/tmag.2021.3085853
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Epitaxial Ferrimagnetic Mn4N Thin Films on GaN by Molecular Beam Epitaxy

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Cited by 4 publications
(4 citation statements)
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“…This temperature‐dependent 2DHG density behavior is similar to previously reported GaN/AlN 2DHGs. [ 4,24 ] The Hall densities are however repeatable across Hall‐effect measurements and samples grown on different MBE systems. The reason for this discrepancy is not yet understood and needs further investigation.…”
Section: Resultsmentioning
confidence: 98%
See 1 more Smart Citation
“…This temperature‐dependent 2DHG density behavior is similar to previously reported GaN/AlN 2DHGs. [ 4,24 ] The Hall densities are however repeatable across Hall‐effect measurements and samples grown on different MBE systems. The reason for this discrepancy is not yet understood and needs further investigation.…”
Section: Resultsmentioning
confidence: 98%
“…InGaN/GaN 2DHGs have among the highest densities across all material systems, and just an order lower than the 2D crystal limit of ≈10 15 cm −2 . The large density of holes provide an epitaxial platform for investigation of scientific phenomena by possible integration of other compatible materials [ 24 ] such as ferrimagnetic Mn 4 N. AlGaN/AlN heterostructures designed using similar principles as presented here could be used for applications which need p s < 5 × 10 13 cm −2 .…”
Section: Discussionmentioning
confidence: 99%
“…Instead of (001) orientation, 111-oriented films can be grown on various substrates, such as 6H-SiC [232] and GaN. [233][234][235] Judging from the nanoelectron-beam diffraction patterns, the superlattice structure of antiperovskite-type Mn 4 N crystal is evident, even when using a MgO(111) substrate. [236] Noncollinear magnetic structures are favored in the 111-oriented Mn 4 N films, efficient STT and/or SOT-induced magnetization switching can be expected for bilayer systems in accordance with previous work.…”
Section: Crystal Orientation Dependencymentioning
confidence: 99%
“…an appropriate material that can be applied to the currentinduced domain wall motion (CIDWM) device due to its low spontaneous magnetization M s (60-110 emu cm −3 ), high uniaxial magnetic anisotropy K u (0.8-2.2 × 10 5 J m −3 ), high domain wall motion velocity (∼900 m s −1 ) and perpendicular magnetic anisotropy (PMA) [4][5][6][7][8]. CIDWM uses the spintransfer torque generated by the spin-polarized current as the driving force to drive the domain wall movement.…”
Section: Introductionmentioning
confidence: 99%