1999
DOI: 10.1557/jmr.1999.0320
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Epitaxial cerium oxide buffer layers and YBa2Cu3O7−δ thin films for microwave device applications

Abstract: CeO2 films with thicknesses ranging from 8.8 to 199 nm were grown on Al2O3 (1102) (R-cut) substrates by off-axis rf magnetron sputtering. X-ray diffraction showed an epitaxial relationship with the CeO2 (001) planes parallel to the Al2O3 (1102) planes for all film thicknesses. Atomic force microscopy (AFM) revealed a rough surface morphology consisting of crystallites with lateral dimensions of 10–90 nm. In the thinnest film, these crystallites were regularly shaped and uniformly distributed on the substrate, … Show more

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Cited by 29 publications
(27 citation statements)
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“…Only a limited number of X-ray crystallographically characterized Ce(OR) 3 [27,28] Ce 4 (µ 4 -O)(µ 3 -OiPr) 2 (µ-OiPr) 4 (OiPr) 8 , [24,29] Ce 3 (µ 3 -OtBu) 2 (µ-OtBu) 3 (OtBu) 5 (NO 3 ), [20] [Ce(µ-OR)(OR) 2 ] 2 where OR = OtBu [23] or OCH(tBu) 2 , [26] Ce[OC(tBu) 3 ] 3 -(CNtBu) 2 , [22] [Ce{OCH(tBu) 2 …”
Section: Resultsmentioning
confidence: 99%
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“…Only a limited number of X-ray crystallographically characterized Ce(OR) 3 [27,28] Ce 4 (µ 4 -O)(µ 3 -OiPr) 2 (µ-OiPr) 4 (OiPr) 8 , [24,29] Ce 3 (µ 3 -OtBu) 2 (µ-OtBu) 3 (OtBu) 5 (NO 3 ), [20] [Ce(µ-OR)(OR) 2 ] 2 where OR = OtBu [23] or OCH(tBu) 2 , [26] Ce[OC(tBu) 3 ] 3 -(CNtBu) 2 , [22] [Ce{OCH(tBu) 2 …”
Section: Resultsmentioning
confidence: 99%
“…Typically, tailoring hydrolysis and condensation pathways of the M(OR) x precursors is of interest and accomplished by introducing a variety of ligands, including carboxylic acids (H-ORc). We have previously explored the structures obtained for group 4 3 = H-ONc], in an effort to understand how structure affects the final densification of thin films. [1,2] A number of general constructs were isolated for these sys-tems but the partially hydrolyzed smaller trinuclear species proved to be the most useful for the generation of highly dense TiO 2 films and simple dinuclear species for ZrO 2 thin films.…”
Section: Introductionmentioning
confidence: 99%
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