Environmental and health risks of chlorine trifluoride (ClF3), an alternative to potent greenhouse gases in the semiconductor industry

Tsai, Wen‐Tien

doi:10.1016/j.jhazmat.2010.10.107

Cited by 17 publications

(8 citation statements)

References 24 publications

(38 reference statements)

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“…Organohalogens: PFCs are used for etching and to clean CVD chambers [ 157 , 215 ]. When under normal operating conditions 10 to 80% of PFCs used in cleaning CVD chambers could pass through the manufacturing tool chambers unreacted and be released into the air [ 157 , 179 ].…”

Section: Materials Challenges In Environmental Safety Health and Sustainability In The Semiconductor Industrymentioning

confidence: 99%

“…When under normal operating conditions 10 to 80% of PFCs used in cleaning CVD chambers could pass through the manufacturing tool chambers unreacted and be released into the air [ 157 , 179 ]. This enhances the greenhouse effect [ 158 , 215 ]. When scaling polymer and brush lithography to an industrial scale green fabrication routes can be selected to eliminate or reduce PFC use.…”

Section: Materials Challenges In Environmental Safety Health and Sustainability In The Semiconductor Industrymentioning

confidence: 99%

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Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Mullen

Morris

2021

Nanomaterials

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The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment. The ecological consequences of semiconductor chip manufacturing are the most predominant within the electronics industry. This is due to current reliance upon large amounts of solvents, acids and gases that have numerous toxicological impacts. Management and assessment of hazardous chemicals is complicated by trade secrets and continual rapid change in the electronic manufacturing process. Of the many subprocesses involved in chip manufacturing, lithographic processes are of particular concern. Current developments in bottom-up lithography, such as directed self-assembly (DSA) of block copolymers (BCPs), are being considered as a next-generation technology for semiconductor chip production. These nanofabrication techniques present a novel opportunity for improving the sustainability of lithography by reducing the number of processing steps, energy and chemical waste products involved. At present, to the extent of our knowledge, there is no published life cycle assessment (LCA) evaluating the environmental impact of new bottom-up lithography versus conventional lithographic techniques. Quantification of this impact is central to verifying whether these new nanofabrication routes can replace conventional deposition techniques in industry as a more environmentally friendly option.

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Section: Materials Challenges In Environmental Safety Health and Sustainability In The Semiconductor Industrymentioning

confidence: 99%

Section: Materials Challenges In Environmental Safety Health and Sustainability In The Semiconductor Industrymentioning

confidence: 99%

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Mullen

Morris

2021

Nanomaterials

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“…Reines PhSF 5 kann durch Hydrolyse von PhSF 4 Cl erhalten werden, wodurch auch mçgliche Reste der Fluoridochlorate abgebaut werden. [26] Durch Achtung! Fluor, selbst unter verdünnten Bedingungen, ist extrem reaktiv und reagiert ggf.…”

Section: Zuschriftenunclassified

Verbesserter Zugang zu organisch löslichen Di‐ und Tetrafluoridochlorat(I/III)‐Salzen

et al. 2020

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Es wird über eine einfache Eintopfsynthese für Tetraalkylammoniumtetrafluoridochlorat(III), [kat][ClF4] ([kat]=[NEt3Me]+, [NEt4]+), im Gramm‐Maßstab berichtet. In Acetonitril wird ein Chloridsalz bei tiefen Temperaturen mit verdünntem Fluor umgesetzt. Das Zwischenprodukt dieser Reaktion, [ClF2]−, wird zum ersten Mal strukturell charakterisiert. Mögliche Anwendungen des [ClF4]−‐Salzes werden durch folgende Reaktionen eruiert: Diphenyldisulfid, Ph2S2, wird in Pentafluorsulfanylbenzol, PhSF5, überführt, sowie die CN‐Gruppen in Acetonitril und in Tetracyanoborat ([B(CN)4]−) in CF3‐Gruppen. Eine Reaktion mit Kohlenstoffmonoxid, CO, führt zu Fluorphosgen, COF2. Elementares Gold löst sich unter Bildung des Tetrafluoridoaurates, [AuF4]−.

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“…However, its decomposition by pyrolysis produces toxic substances such as carbonyl fluoride (COF 2 ) and hydrogen fluoride (HF). 14,15 For this reason, adsorption is more appropriate for CF 4 disposal without producing byproducts compared to the pyrolysis methods. Zeolites, activated carbons, metal−organic frameworks, and new materials have been widely used as adsorbents for CO 2 separation.…”

Section: Introductionmentioning

confidence: 99%

CF₄ Adsorption on Microporous Carbons Prepared by Carbonization of Poly(vinylidene fluoride)

Choi

Hong

Park

et al. 2015

Ind. Eng. Chem. Res.

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CF 4 is a gas with high global warming potential and has an extremely long atmospheric lifetime. This study developed a method for capturing CF 4 gas via adsorption using microporous carbons. Microporous carbon adsorbents were synthesized by a facile protocol involving carbonization of poly(vinylidene fluoride) (PVDF) at high temperatures (400−800°C) without additional activation, and the effects of carbonization on the characteristics and CF 4 adsorption of PVDF-based adsorbents were investigated. Increasing the carbonization temperature enhanced the textural properties of the adsorbent, resulting in the increased CF 4 adsorption capacity. Above 700°C, PVDF was fully dehydrofluorinated, and the microporous carbon synthesized at 800°C exhibited superior textural properties with a maximum CF 4 adsorption capacity of 1.85 mol/kg at 25°C under atmospheric pressure. The PVDF-based microporous carbons also exhibited fast adsorption−desorption kinetics, excellent cyclic stability, and good selectivity for CF 4 over N 2 at relatively low CF 4 pressures. The microporous carbons developed in this study have potential for use as novel adsorbents for CF 4 capture.

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Environmental and health risks of chlorine trifluoride (ClF3), an alternative to potent greenhouse gases in the semiconductor industry

Cited by 17 publications

References 24 publications

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Verbesserter Zugang zu organisch löslichen Di‐ und Tetrafluoridochlorat(I/III)‐Salzen

CF₄ Adsorption on Microporous Carbons Prepared by Carbonization of Poly(vinylidene fluoride)

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Environmental and health risks of chlorine trifluoride (ClF3), an alternative to potent greenhouse gases in the semiconductor industry

Cited by 17 publications

References 24 publications

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective

Verbesserter Zugang zu organisch löslichen Di‐ und Tetrafluoridochlorat(I/III)‐Salzen

CF4 Adsorption on Microporous Carbons Prepared by Carbonization of Poly(vinylidene fluoride)

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CF₄ Adsorption on Microporous Carbons Prepared by Carbonization of Poly(vinylidene fluoride)