2018
DOI: 10.1109/jeds.2018.2833504
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Enhancing the Electrical Uniformity and Reliability of the HfO2-Based RRAM Using High-Permittivity Ta2O5 Side Wall

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Cited by 19 publications
(10 citation statements)
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“…Figure a displays the core level spectra of Ta 4f. The Ta 4f spectrum confirms the doublet peaks of about 24 eV (Ta 4f 7/2 ) and 26.5 eV (Ta 4f 5/2 ), corresponding to Ta–O bonds from the top TaO x layer. , …”
Section: Resultssupporting
confidence: 52%
See 1 more Smart Citation
“…Figure a displays the core level spectra of Ta 4f. The Ta 4f spectrum confirms the doublet peaks of about 24 eV (Ta 4f 7/2 ) and 26.5 eV (Ta 4f 5/2 ), corresponding to Ta–O bonds from the top TaO x layer. , …”
Section: Resultssupporting
confidence: 52%
“…The Ta 4f spectrum confirms the doublet peaks of about 24 eV (Ta 4f 7/2 ) and 26.5 eV (Ta 4f 5/2 ), corresponding to Ta−O bonds from the top TaO x layer. 49,50 Figure 3b depicts the doublet peaks of about 1023 eV (Zn 2p 3/2 ) and 1046 eV (Zn 2p 1/2 ), corresponding to the Zn−O bonds, and Figure 3c shows doublet peaks of 487.5 (Sn 3d 5/2 ) and 597 eV (Sn 3d 3/2 ), corresponding to Sn−O bonds, both from the bottom ZTO layer. 40−42 The XPS spectra of Ta 4f, Zn 2p, and Sn 3d confirm that there are no interfacial reactions between the TaO x and ZTO layers.…”
Section: Resultsmentioning
confidence: 99%
“…Ag + , after reaching the BE, get reduced and finally form a localized conductive path, resulting in the flow of higher currents and producing lower resistance values. 27 Moreover, at the same instant, the device abruptly changes its state from HRS to LRS, considered to be the SET state of the memory device, which is clearly shown in Figure 4c. As the polarity of the applied voltage reverses, at one particular voltage, namely, V reset , a very high electric field is generated in the opposite direction to the previous state, leading to a breakdown of the formed metallic filament bridge; i.e., Ag gets redistributed at the near boundaries of the BE, and then instantly the device switches its state from LRS to HRS, which is illustrated in Figure 4d.…”
Section: ■ Results and Discussionmentioning
confidence: 96%
“…At these higher electric fields, there will be a soft breakdown of the dielectric strength of V 2 O 5 , leading to the formation of some defect sites producing V 5+ , and O 2– and Ag + quickly start to hop from the TE to BE. Ag + , after reaching the BE, get reduced and finally form a localized conductive path, resulting in the flow of higher currents and producing lower resistance values . Moreover, at the same instant, the device abruptly changes its state from HRS to LRS, considered to be the SET state of the memory device, which is clearly shown in Figure c.…”
Section: Resultsmentioning
confidence: 96%
“…As the via size decreases, the forming electric field (E Forming ) of the pure HfO 2 device rises. 24,25) By doping Ag into the switching layer, the critical electric field of the switching layer can be effectively reduced. Therefore, the E Forming of the Ag-doped device will not rise as the device size scales down, meaning that there is no size effect that occurs in the Ag-doped device.…”
mentioning
confidence: 99%