Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures
Alexandre Chapotot,
Jérémie Chrétien,
Oleh Fesiienko
et al.
Abstract:Efficiently passivating germanium (Ge) surfaces is crucial to reduce the unwanted recombination current in high-performance devices. Chemical surface cleaning is critical to remove surface contaminants and Ge oxides, ensuring effective surface passivation after dielectric deposition. However, Ge oxides can rapidly regrow upon air exposure. To understand the surface evolution after wet cleaning, we present a comprehensive study comparing HF and HCl deoxidation steps on p-type Ge surfaces and monitor the surface… Show more
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