2011
DOI: 10.1063/1.3647779
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Enhancements of extreme ultraviolet emission using prepulsed Sn laser-produced plasmas for advanced lithography applications

Abstract: Laser-produced plasmas (LPP) from Sn targets are seriously considered to be the light source for extreme ultraviolet (EUV) next generation lithography, and optimization of such a source will lead to improved efficiency and reduced cost of ownership of the entire lithography system. We investigated the role of reheating a prepulsed plasma and its effect on EUV conversion efficiency (CE). A 6 ns, 1.06 lm Nd:yttrium aluminum garnet laser was used to generate the initial plasma that was then reheated by a 40 ns, 1… Show more

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Cited by 45 publications
(29 citation statements)
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References 25 publications
(34 reference statements)
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“…Some of the key applications are pulsed laser deposition (PLD), 1 nanoparticle, nanostructure and cluster formation, 2,3 laser induced breakdown spectroscopy (LIBS), 4,5 LA inductively coupled plasma mass spectrometry (LA-ICP-MS) 6 and light sources for lithography, 7 and microscopy. 8 Understanding plasma plume dynamics is important for optimizing LPPs for all of these applications.…”
Section: Introductionmentioning
confidence: 99%
“…Some of the key applications are pulsed laser deposition (PLD), 1 nanoparticle, nanostructure and cluster formation, 2,3 laser induced breakdown spectroscopy (LIBS), 4,5 LA inductively coupled plasma mass spectrometry (LA-ICP-MS) 6 and light sources for lithography, 7 and microscopy. 8 Understanding plasma plume dynamics is important for optimizing LPPs for all of these applications.…”
Section: Introductionmentioning
confidence: 99%
“…Laser ablation (LA) and plasma generation already have numerous applications. These include narrowband short wavelength light sources for lithography 1 and microscopy, 2 broadband sources for spectroscopy, 3 analytical applications ranging from laser-induced breakdown spectroscopy (LIBS), 4 LA inductively coupled plasma mass-spectrometry (LA-ICP-MS) 5 to matrix-assisted laser desorption/ionization (MALDI), 6 micromachining, 7 pulsed laser deposition (PLD), 8 nanoparticle production, 9 laser ion source (LIS), 10 etc. In light source applications, pulsed, high intensity lasers are used to heat and vaporize the material of interest in vacuum.…”
Section: Introductionmentioning
confidence: 99%
“…INTRODUCTION X-ray emissions from laser-produced plasmas have attracted strong interests in the past decades due to their extensive applications in many fields, such as XUV(extreme ultra violet)-soft x-ray lasers, 1 advanced lithography, 2 x-ray backlighting, 3,4 inertial confinement fusion (ICF), 5,6 etc. In these applications, the most desirable objective is to maximize the x-ray radiation intensity by choosing proper laser and target parameters.…”
mentioning
confidence: 99%