2002
DOI: 10.1063/1.1468918
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Enhancement of photoluminescence by microdisk formation from Si/Ge/Si single quantum wells

Abstract: Anisotropic strain effects on the photoluminescence emission from heteroepitaxial and homoepitaxial nonpolar (Zn,Mg)O/ZnO quantum wells

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Cited by 7 publications
(9 citation statements)
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“…To further improve the quantum efficiency of Si/Ge heterostructures, different surface microstructures have also been proposed. The Choi group [ 12 ] observed a huge enhancement in the photoluminescence (PL) spectra from microdisk arrays of Si/Ge/Si SQW and proposed several mechanisms for the enhancement. One is the localization of excitons, which are spatially confined by the diameter of the microdisk.…”
Section: Introductionmentioning
confidence: 99%
“…To further improve the quantum efficiency of Si/Ge heterostructures, different surface microstructures have also been proposed. The Choi group [ 12 ] observed a huge enhancement in the photoluminescence (PL) spectra from microdisk arrays of Si/Ge/Si SQW and proposed several mechanisms for the enhancement. One is the localization of excitons, which are spatially confined by the diameter of the microdisk.…”
Section: Introductionmentioning
confidence: 99%
“…A significant enhancement of the quantum efficiency in the PL spectra has been observed by forming GaN/AlGaN MQW microdisks of about 9-μm diameter and interpreted as a suppression of impurity-related transitions [38]. Choi et al also associated the PL enhancement with carrier localization in the 500- and 1,000-nm-diameter Si/Ge/Si microdisks fabricated by electron beam lithography, the existence of which suppresses impurity-related nonradiative combination [9]. The similar mechanism may also contribute to the enhancement of PL intensity in our SiGe/Si MQW nanorod arrays.…”
Section: Resultsmentioning
confidence: 99%
“…The well-known top-down techniques providing accurate size and geometric control in periodic semiconductor nanostructure patterning include laser interference lithography [6], nanoimprint lithography [7], ion beam lithography [8], and electron beam lithography [9]. However, the cost and complexity of these techniques increase dramatically with the demand for reduced feature sizes over large areas.…”
Section: Introductionmentioning
confidence: 99%
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“…Several approaches to enhance luminescence have been developed in two ways: one is to increase the radiative recombination rate of excitons, the second is to reduce the number of non-radiative recombination paths. Most efforts have focused on the quantum confinement effect of silicon nanocrystals [2][3][4][5] or dislocation loops [6,7] , which lead to a direct band transition. Emission center addition like Er doping offers another road to emission enhancement [8,9] .…”
Section: Introductionmentioning
confidence: 99%