2007
DOI: 10.1109/lpt.2007.901718
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Enhancement of Flip-Chip Light-Emitting Diodes With Omni-Directional Reflector and Textured Micropillar Arrays

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Cited by 25 publications
(14 citation statements)
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“…Owing to the index mismatch of GaN epilayer, sapphire substrate and air, the majority of photons are trapped in the high-index epilayer and sapphire substrate by total internal reflection (TIR) and guided laterally as waveguide modes, which finally dissipate in the lossy epilayer. Several methods have been proposed to extract the waveguide photons of flip-chip LEDs, such as texturing the sapphire subtract surface [16,17,18], shaping the sapphire substrate [19,20], plasmonic structure [21], and depositing nanoparticles or scattering layers [22,23]. Such approaches are effective in extraction of the sapphire substrate mode photons, while additional protection procedures are generally needed owing to the more inert property of sapphire substrate relative to the epilayer.…”
Section: Introductionmentioning
confidence: 99%
“…Owing to the index mismatch of GaN epilayer, sapphire substrate and air, the majority of photons are trapped in the high-index epilayer and sapphire substrate by total internal reflection (TIR) and guided laterally as waveguide modes, which finally dissipate in the lossy epilayer. Several methods have been proposed to extract the waveguide photons of flip-chip LEDs, such as texturing the sapphire subtract surface [16,17,18], shaping the sapphire substrate [19,20], plasmonic structure [21], and depositing nanoparticles or scattering layers [22,23]. Such approaches are effective in extraction of the sapphire substrate mode photons, while additional protection procedures are generally needed owing to the more inert property of sapphire substrate relative to the epilayer.…”
Section: Introductionmentioning
confidence: 99%
“…This natural lithography approach using ordered SiO 2 nanospheres as mask material is superior for large area, volume processes as it is very simple and fast compared to other methods such as imprinting, electron-beam lithography, focused-ion beam pattering and conventional photolithography [20][21][22]. Furthermore, this approach is highly reproducible, particularly compared to a photo-electro-chemical wet etch process based on a KOH solution.…”
Section: Resultsmentioning
confidence: 99%
“…[ 127 ] FCLEDs usually use thick emission window layer, and the index difference between the sapphire substrate ( n = 1.7) and the air is much smaller than GaN. [ 128 ] There are also methods such as using photonic crystals, [ 129 ] plasmonic nanostructures, [ 130 ] micro‐pillar arrays, [ 131 ] and rough surfaces. [ 132 ] The light out‐coupling methods for commercial LEDs are quite generic and can be used for PeLEDs also.…”
Section: Light Out‐coupling Strategies For Ledsmentioning
confidence: 99%