“…The variation of the areal capacitance with scan rate and current density is displayed in (Figure 8 at 10 mV.s -1 and 1.6 mA.cm -2 , respectively) is higher than of CrN thin film Ref [21] (in the range of 12.8 mF.cm −2 at 1.0 mA cm -2 ). Much higher than of MnO2-SiNWs electrodes ref [33] and [12] (in A c c e p t e d M a n u s c r i p t 10 the range of 21.296 and 13.38 mF.cm −2 at 10 mV.s -1 respectively) and much higher than of carbon-SiNWs electrodes ref [11] (in the range of 25.6 mF.cm −2 at 0.1 mA cm -2 ).These results confirm the high performance of SiNWs-CrN composites for ECs application. The superior performance of SiNWs-CrN 500 nm can be attributed to the larger surface area (highly nanoporous channels), which The cycling stability of SiNWs-CrN 500 nm electrode at scan rate of 100 mV.s -1 is presented in Figure 10.…”
Silicon nanowire (SiNWs) arrays were coated with chromium nitride (CrN) for use as super-capacitor electrodes. The CrN layer with different thicknesses were deposited onto SiNWs using bipolar magnetron sputtering method. The areal capacitance of the SiNWs-CrN, as measured in 0.5 M H2SO4 electrolyte, was as high as mF.cm −2 at a scan rate of mV.s −1 (equivalent to 31.8 mF.cm −2 at 1.6 mA.cm −2) with an excellent electrochemical retention of 92% over 15000 cycles. This work paves the way toward using CrN modified 3D SiNWs arrays for micro-supercapacitor application.
“…The variation of the areal capacitance with scan rate and current density is displayed in (Figure 8 at 10 mV.s -1 and 1.6 mA.cm -2 , respectively) is higher than of CrN thin film Ref [21] (in the range of 12.8 mF.cm −2 at 1.0 mA cm -2 ). Much higher than of MnO2-SiNWs electrodes ref [33] and [12] (in A c c e p t e d M a n u s c r i p t 10 the range of 21.296 and 13.38 mF.cm −2 at 10 mV.s -1 respectively) and much higher than of carbon-SiNWs electrodes ref [11] (in the range of 25.6 mF.cm −2 at 0.1 mA cm -2 ).These results confirm the high performance of SiNWs-CrN composites for ECs application. The superior performance of SiNWs-CrN 500 nm can be attributed to the larger surface area (highly nanoporous channels), which The cycling stability of SiNWs-CrN 500 nm electrode at scan rate of 100 mV.s -1 is presented in Figure 10.…”
Silicon nanowire (SiNWs) arrays were coated with chromium nitride (CrN) for use as super-capacitor electrodes. The CrN layer with different thicknesses were deposited onto SiNWs using bipolar magnetron sputtering method. The areal capacitance of the SiNWs-CrN, as measured in 0.5 M H2SO4 electrolyte, was as high as mF.cm −2 at a scan rate of mV.s −1 (equivalent to 31.8 mF.cm −2 at 1.6 mA.cm −2) with an excellent electrochemical retention of 92% over 15000 cycles. This work paves the way toward using CrN modified 3D SiNWs arrays for micro-supercapacitor application.
“…The composite Mn oxide-Ag 0 NPs function as efficient electrocatalysts for the fuel cell ORR reaction by facilitating the formation and disproportionation of HO 2 – in alkaline solution. An additional example involving the deposition of MnO 2 onto H-terminated Si for supercapacitor fabrication is described elsewhere ( vide supra , Nonmetals section).…”
The electroless plating of metals and their alloys, oxides, and chalcogenides represents a critically important technology for the automotive, aerospace, machine tools, and, especially, the electronics industries. Since the initial efforts involving the plating of industrially important metals, such as Ni, Co, Cu, Ag, and Au, in the mid-20th century, the process has evolved to encompass a growing number of elements. At the same time, this expansion in the palette of accessible metals has enabled progress in these industries and evoked new nonconventional applications. In this review, we collect and survey available electroless processes in aqueous and organic solvent systems for each element organized according to position in the Periodic Table as a resource for the reader. Examples illustrating progress in the field are presented and are described in sufficient detail to be useful and understandable for both the expert and nonexpert. Given the historical importance of electronics as a driver for development of electroless processes, examples are electronics-related where possible. However, we strive to also include examples of applications in nontraditional fields to provide the reader with a sense of generality available for electroless methods. The review closes with an outlook for the field and a challenge to scientists and engineers to adapt electroless processes for new applications to continue the growth of the field.
“…Silicon and its derivatives such as SiNW (Si nanowires), SiO 2 , SiC have been tested alone or in composite with other materials as EDLC by several researchers as presented in Table 1 [32][33][34][35][36][37][38][39].…”
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