2012
DOI: 10.1128/aem.00619-12
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Enhanced Tolerance to Naphthalene and Enhanced Rhizoremediation Performance for Pseudomonas putida KT2440 via the NAH7 Catabolic Plasmid

Abstract: ABSTRACTIn this work, we explore the potential use of thePseudomonas putidaKT2440 strain for bioremediation of naphthalene-polluted soils.Pseudomonas putidastrain KT2440 thrives in naphthalene-saturated medium, establishing a complex response that activates genes coding for extrusion pumps and cellular damage repair enzymes, as well as gene… Show more

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Cited by 61 publications
(38 citation statements)
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“…Some of the changes that can occur in the membrane, when bacteria are exposed to hydrophobic solvents, include vesicle formation, alteration of phospholipid composition, and reduced permeability of the cell membrane (Heipieper & De Bont, 1994; Nicolaou, Gaida, & Papoutsakis, 2010; Ramos et al, 2002). The mechanisms behind tolerance in the model strain P. putida KT2440 has also been studied for different compounds (Benndorf, Thiersch, Loffhagen, Kunath, & Harms, 2006; Domínguez‐Cuevas, González‐Pastor, Marqués, Ramos, & de Lorenzo, 2006; Fernandez, Conde et al, 2012; Fernandez, Niqui‐Arroyo, Conde, Ramos, & Duque, 2012; Roca, Rodríguez‐Herva, Duque, & Ramos, 2008; Santos, Benndorf, & Sá‐Correia, 2004). …”
Section: Introductionmentioning
confidence: 99%
“…Some of the changes that can occur in the membrane, when bacteria are exposed to hydrophobic solvents, include vesicle formation, alteration of phospholipid composition, and reduced permeability of the cell membrane (Heipieper & De Bont, 1994; Nicolaou, Gaida, & Papoutsakis, 2010; Ramos et al, 2002). The mechanisms behind tolerance in the model strain P. putida KT2440 has also been studied for different compounds (Benndorf, Thiersch, Loffhagen, Kunath, & Harms, 2006; Domínguez‐Cuevas, González‐Pastor, Marqués, Ramos, & de Lorenzo, 2006; Fernandez, Conde et al, 2012; Fernandez, Niqui‐Arroyo, Conde, Ramos, & Duque, 2012; Roca, Rodríguez‐Herva, Duque, & Ramos, 2008; Santos, Benndorf, & Sá‐Correia, 2004). …”
Section: Introductionmentioning
confidence: 99%
“…The Gram-negative bacterium Pseudomonas putida KT2440 is an efficient colonizer of the root system of different plants that activates induced systemic resistance in the plant and can be used in rhizoremediation (18,19,20). P. putida KT2440 is also able to develop biofilms on biotic and abiotic surfaces, and molecular determinants participating in these processes have been described.…”
mentioning
confidence: 99%
“…For instance, P. aeruginosa can grow in the presence of a variety of aliphatic and aromatic compounds such as lactate (Gao et aromatic fl uoranthene, phenanthrene (Zhang et al 2011), hexadecane, benzene, toluene (S Mukherjee et al 2010), paracetamol (Hu et al 2013), and 4-chlorobenzoate (Hoskeri et al 2011). Similar wide range of assimilation of substrates has been reported with other species of the same genus, such as Pseudomanas putida with biodegradation of aromatic compounds (Diaz et al 2008, Ebrahimi and Plettner 2013, El-Naas et al 2009, Fernandez et al 2012, Hwang et al 2009, Li et al 2011, Q Lin and Jianlong 2010, Phale et al 2013, Takeo et al 2006, You et al 2013) and alkane derivatives (Dunn et al 2005, Johnson and Hyman 2006, Smith and Hyman 2004. In line with previous reports, Pseudomonas aeruginosa strain N7B1 had a wide range of substrate specifi city, thus is an important bacterium that could be used in bioremediation strategies.…”
Section: Substrate Utilizationmentioning
confidence: 60%
“…The second pathway has been studied the most, and genes encoding for these catabolic enzymes are generally found in bacterial extra-chromosome plasmids, and plasmids from several bacterial species have been A. Nzila, A. Thukair, S. Sankara, B. Chanbasha, M.M. Musa characterized, including the plasmid NAH7 of Pseudomonas putida strain G (Fernandez et al 2012), pAK5 of Pseudomonas putida strain AK5 (Izmalkova et al 2013), and plasmid of Gordonia sp. strain CC-NAPH129-6 (Izmalkova et al 2013).…”
Section: Detection Of Metabolites By Gc-msmentioning
confidence: 99%