Abstract:A metal-source flow-rate modulation epitaxy method is reported to enhance the hole concentration of Mg-doped AlGaN grown by metal organic chemical vapor deposition. The hole concentration of p-type AlGaN (Al content 0.43) is increased to 2.3 × 1017 cm−3 at room temperature by this method, which is about ten times higher than that of the conventional growth. The resistivity was found to be as low as 12.7 Ω·cm. Furthermore, the effective acceptor activation energy (EA) in the AlGaN films (Al content 0.32–0.43) w… Show more
“…4a ). The resistivity at 300 K is about 8.0 Ω cm, which is relatively lower compared to some recent results 30 , 31 . The E a can be estimated by based on the temperature-dependent resistivity, where ρ , T , ΔE , k B , and ρ 0 are the resistivity, temperature, E a , Boltzmann constant, and fitting coefficient, respectively 32 .…”
Ultra-wide band-gap nitrides have huge potential in micro- and optoelectronics due to their tunable wide band-gap, high breakdown field and energy density, excellent chemical and thermal stability. However, their application has been severely hindered by the low p-doping efficiency, which is ascribed to the ultrahigh acceptor activation energy originated from the low valance band maximum. Here, a valance band modulation mode is proposed and a quantum engineering doping method is conducted to achieve high-efficient p-type ultra-wide band-gap nitrides, in which GaN quantum-dots are buried in nitride matrix to produce a new band edge and thus to tune the dopant activation energy. By non-equilibrium doping techniques, quantum engineering doped AlGaN:Mg with Al content of 60% is successfully fabricated. The Mg activation energy has been reduced to about 21 meV, and the hole concentration reaches higher than 1018 cm−3 at room temperature. Also, similar activation energies are obtained in AlGaN with other Al contents such as 50% and 70%, indicating the universality of the quantum engineering doping method. Moreover, deep-ultraviolet light-emission diodes are fabricated and the improved performance further demonstrates the validity and merit of the method. With the quantum material growth techniques developing, this method would be prevalently available and tremendously stimulate the promotion of ultra-wide band-gap semiconductor-based devices.
“…4a ). The resistivity at 300 K is about 8.0 Ω cm, which is relatively lower compared to some recent results 30 , 31 . The E a can be estimated by based on the temperature-dependent resistivity, where ρ , T , ΔE , k B , and ρ 0 are the resistivity, temperature, E a , Boltzmann constant, and fitting coefficient, respectively 32 .…”
Ultra-wide band-gap nitrides have huge potential in micro- and optoelectronics due to their tunable wide band-gap, high breakdown field and energy density, excellent chemical and thermal stability. However, their application has been severely hindered by the low p-doping efficiency, which is ascribed to the ultrahigh acceptor activation energy originated from the low valance band maximum. Here, a valance band modulation mode is proposed and a quantum engineering doping method is conducted to achieve high-efficient p-type ultra-wide band-gap nitrides, in which GaN quantum-dots are buried in nitride matrix to produce a new band edge and thus to tune the dopant activation energy. By non-equilibrium doping techniques, quantum engineering doped AlGaN:Mg with Al content of 60% is successfully fabricated. The Mg activation energy has been reduced to about 21 meV, and the hole concentration reaches higher than 1018 cm−3 at room temperature. Also, similar activation energies are obtained in AlGaN with other Al contents such as 50% and 70%, indicating the universality of the quantum engineering doping method. Moreover, deep-ultraviolet light-emission diodes are fabricated and the improved performance further demonstrates the validity and merit of the method. With the quantum material growth techniques developing, this method would be prevalently available and tremendously stimulate the promotion of ultra-wide band-gap semiconductor-based devices.
“…To date, numerous efforts have been made to improve the con- ductivity property of the p-type Al x Ga 1−x N grown layers by increasing the hole concentration in magnesium-doped Al x Ga 1−x N and decreasing its acceptor activation energy. In spite of several approaches developed to overcome this obstacle, including magnesium-delta doping [180,416] , co-doping [417] , and polarization-induced doping [418] , these struc-tures involve wurtzite crystallographic orientations and suffer from high polarization effects, which result in even larger acceptor activation energies. During the Al x Ga 1−x N growth process, applying nitrogen-rich conditions with large V/III ratios is favorable to achieve better magnesium incorporation and smoother morphology structures.…”
Deep-ultraviolet integrated photonic and optoelectronic devices: A prospect of the hybridization of group III-nitrides, III-oxides, and twodimensional materials To cite this article: Nasir Alfaraj et al 2019 J. Semicond. 40 121801 View the article online for updates and enhancements.
“…As an alternative to mercury lamps, AlGaN based UVC‐light‐emitting diodes (LEDs) present much higher power density, therefore are naturally suitable (already applied in some cases, e. g. water purification, air, and surfaces anti‐bacterial) for various disinfection purposes. [ 9–13 ] Although Nunayon et al. has confirmed the outstanding disinfection performance of UVC‐LEDs in impeding/extirpating indoor bioaerosol of influenza viruses H 1 N 1 and H 3 N 2 (who are also coronaviruses), which is competitive with mercury lamps, the direct experimental evidence reported for eliminating the SARS‐CoV‐2 with UVC is very limited, especially, there is no report for the ultra‐fast elimination.…”
The world‐wide spreading of coronavirus disease (COVID‐19) has greatly shaken human society, thus effective and fast‐speed methods of non‐daily‐life‐disturbance sterilization have become extremely significant. In this work, by fully benefitting from high‐quality AlN template (with threading dislocation density as low as ≈6×10
8
cm
−2
) as well as outstanding deep ultraviolet (UVC‐less than 280 nm) light‐emitting diodes (LEDs) structure design and epitaxy optimization, high power UVC LEDs and ultra‐high‐power sterilization irradiation source are achieved. Moreover, for the first time, a result in which a fast and complete elimination of SARS‐CoV‐2 (the virus causes COVID‐19) within only 1 s is achieved by the nearly whole industry‐chain‐covered product. These results advance the promising potential in UVC‐LED disinfection particularly in the shadow of COVID‐19.
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