Enhanced oxidation resistance of HfB2‐SiC‐ZrSi2 coating at 1700°C through low‐loss film‐forming treatment
Menglin Zhang,
Xiang Ji,
Youkui Zhang
et al.
Abstract:To enhance the oxidation resistance of HfB2‐SiC‐ZrSi2 coating, low‐loss film‐forming treatment (LFT) was employed to generate high‐quality oxygen barrier glass layers, and the modification effect of varying formation temperature on the oxidation resistance was investigated at 1700°C. The results demonstrated that, with LFT at 1500°C, the relatively modest oxidation activity and complete dispersion of metal oxide nanocrystals generated a compact and continuous composite glass layer, which caused a decreased oxi… Show more
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