Enhanced OLED performance upon photolithographic patterning by using an atomic-layer-deposited buffer layer

Chang, Chih Yu; Tsai, Feng Yu; Jhuo, S.-J.; Chen, Miin Jang

doi:10.1016/j.orgel.2008.04.009

Cited by 47 publications

(25 citation statements)

References 31 publications

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“…In addition, in the area of protein-based biomaterial research, the ALD approach for developing new types of metal-biopolymer hybrid materials could bring about rapid progress, if processing conditions are well optimized. [49][50][51][52][53] …”

Section: Supporting Informationmentioning

confidence: 99%

An Alternative Route Towards Metal–Polymer Hybrid Materials Prepared by Vapor‐Phase Processing

Lee

Ischenko

Pippel

et al. 2011

Adv Funct Materials

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Transition metals incorporated into polymers lead to unusual or improved physical properties that significantly differ from those of purely organic polymers. A simple and practicable incorporation of diverse transition metals into any available polymer would make an important contribution to overcome some of the synthetic difficulties of metal‐polymer hybrid materials. Here, it is demonstrated that atomic layer deposition (ALD) can be a promising means to resolve some of those difficulties. It is found that even polytetrafluoroethylene (PTFE) with its great physical and chemical stability can be easily transformed into a transition metal–PTFE hybrid material simply by applying a metal‐oxide ALD process to PTFE. Upon metal incorporation into the PTFE, the molecular structure as well as mechanical properties (tensile behavior) of PTFE were observed to significantly change. For a better understanding of the changes to the material, experimental investigations using Raman spectroscopy, attenuated‐total‐reflection Fourier‐transform infrared spectroscopy, wide‐angle X‐ray diffraction, and energy‐dispersive X‐ray analysis were performed. In addition, with density functional theory calculations, potential bonding states of the incorporated metal into PTFE were modeled and predicted. The ALD‐based vapor‐phase approach for metal incorporation into a polymer could bring about rapid progress in the research area of metal–polymer hybrid materials.

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Section: Supporting Informationmentioning

confidence: 99%

An Alternative Route Towards Metal–Polymer Hybrid Materials Prepared by Vapor‐Phase Processing

Lee

Ischenko

Pippel

et al. 2011

Adv Funct Materials

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“…In addition, infiltration of ALD precursors and induction of chemical reactions has general significance for the application of ALD in various technological fields. For example, it has been suspected that CÀC double bonds were accessible to trimethylaluminum, [24] a standard ALD metal precursor, and physical infiltration in the absence of chemical interactions has been also proposed by George et al [25,26] In another example, infiltration by ALD induced significant mechanical charges to spider silks, of which the chemical nature is not yet known in detail. [27] Certainly, the occurrence of chemical infiltration will depend on both the parameters of the ALD process and chemical properties of the template and the precursors; for example, the length of exposure and purging time, the molecule size, functional groups on the template, and the reactivity of the involved precursors and groups.…”

mentioning

confidence: 99%

Chemical Infiltration during Atomic Layer Deposition: Metalation of Porphyrins as Model Substrates

Zhang

Patil

et al. 2009

Angewandte Chemie

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Atomic layer deposition (ALD) is a gas-phase deposition process based on successive self-terminating gas-solid reactions. During the process, the template substrate is exposed to precursor molecules from the gas phase, which ideally promotes adsorption of a monolayer on the surface. After purging the excess precursor and subsequent exposure to a second gaseous precursor, reaction on the surface of the substrate leads to formation of a layer of the desired material. The layer thickness is controlled by the number of the reaction cycles. Owing to the precise thickness control and broad range of operating temperatures, ALD has recently been used for coating various structures, including thermally and chemically sensitive organic and biological macromolecules. [1][2][3] Much work has also been performed to develop new precursors and new processes to increase the versatility of ALD. For example, a number of studies have been devoted to the investigation of the interface chemistry during the deposition process to achieve better control over the deposition rate and the area selectivity of the deposition. Several reviews about ALD have been recently published. [4][5][6] To date, only little attention has been paid to the chemical interactions between the precursors and the substrate underneath the macroscopic interface formed during the ALD process. It is essential to understand such interactions, particularly as an increasing number of organic soft materials are being used in ALD processes to fulfill various tasks: for example, as masks for area-selective deposition, [1] scaffolds for hybrid material fabrication, [7] or templates for the fabrication of nanostructures.[8] Such materials normally contain various functional groups that are potentially reactive with ALD precursors. Precursors can diffuse through polymer layers during the ALD process, but the chemical interactions between the precursors and the substrate during the diffusion process has only been proposed. [3,9] Herein, we use J-aggregate nanostructures composed of meso-tetra(p-phenylsulfonato)porphyrin (TSPP) or meso-tetraphenylporphyrin (H 2 TPP) as model substrates for standard metal oxide ALD, and show for the first time that the precursor can infiltrate the substrate at the molecular level and induce site-specific metalation. Self-assembly of protonated TSPP molecules into J-aggregate nanotapes occurs through electrostatic interactions between the negatively charged sulfonato groups and positively charged pyrrole amine groups, [10] which are also potential active sites for interactions with ALD precursors. Moreover, the protonated and deprotonated monomer and the J-aggregate of TSPP have distinct light absorption profiles, [11] which provides a convenient method for analysis. Specifically, we show that processing the J-aggregates with standard ZnO-ALD results in infiltration of the metal precursor diethylzinc into the TSPP J-aggregates and induces metalation of TSPP molecules with zinc(II) ions. Formation of the metalloporphyrins was confirmed by UV/Vis...

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“…However, recently some groups have reported that, in the case of a polymer substrate, the ALD film growth differed from growth on other solid substrates in that the ALD process changed the chemical structure of the polymer. [7][8][9][10] More recently, we have reported even more convincing results to support the fact that ALD can modify the physical/chemical properties of soft materials (such as biomaterials). [11][12][13] It has been found that metals can infiltrate biomaterials, such as spider dragline silk and collagen membrane, during alternating exposure/purge steps of multiple pulses of precursor vapors that occur during the ALD process.…”

Section: Introductionmentioning

confidence: 74%

Metal Infiltration into Biomaterials by ALD and CVD: A Comparative Study

2011

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Atomic layer deposition (ALD) is a subset of chemical vapor deposition (CVD) and both use very similar chemistry. Recently, it has been reported that ALD has the potential to realize a new design paradigm of bioinorganic materials through metal infiltration, which in nature has been employed as a hardening strategy for many tissues in diverse biological organisms. Herein, using a spider dragline silk and a collagen membrane as targets, we have performed a comparative study to elucidate the difference of the metal infiltration effect by ALD and CVD. From the comparison of mechanical properties, concentration of the infiltrated metal, and structural changes induced by the infiltrated metal, it has been proven that the metal can effectively infiltrate biomaterials by ALD and the infiltrated metal leads to highly improved mechanical properties accompanied by substantial changes in the protein structures, whereas CVD is less effective.

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Enhanced OLED performance upon photolithographic patterning by using an atomic-layer-deposited buffer layer

Cited by 47 publications

References 31 publications

An Alternative Route Towards Metal–Polymer Hybrid Materials Prepared by Vapor‐Phase Processing

An Alternative Route Towards Metal–Polymer Hybrid Materials Prepared by Vapor‐Phase Processing

Chemical Infiltration during Atomic Layer Deposition: Metalation of Porphyrins as Model Substrates

Metal Infiltration into Biomaterials by ALD and CVD: A Comparative Study

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