2010
DOI: 10.1143/apex.4.012101
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Enhanced Light Output of AlGaInP Light Emitting Diodes Using an Indium–Zinc Oxide Transparent Conduction Layer and Electroplated Metal Substrate

Abstract: The use of indium–zinc oxide (IZO) as a transparent conduction layer (TCL) for electroplated nickel metal substrate AlGaInP light-emitting diodes with a 300×300 µm2 chip size was investigated with regard to both fabrication and effectiveness in improving light extraction efficiency. A metal system consisting of AuGe/Au was deposited to form ohmic contact dots for the n+-GaAs layer, and then an IZO film was deposited to serve as a TCL. Compared with conventional light emitting diodes (LEDs) with GaAs substrates… Show more

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Cited by 7 publications
(5 citation statements)
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“…By reducing the defect density in the perovskite layer, controlling strain and crystal phase, and improving crystalline order, electronic properties can be enhanced and quantum devices can be developed. Indeed, the ability to exploit epitaxy and epitaxial strain in silicon (Si) and III-V semiconductors revolutionized modern computing and optoelectronics and led to improved photovoltaics ( Bertness et al., 1994 ; Dai et al., 2015 ; King et al., 2007 ; Lee et al., 2012a ; Takamoto et al., 1997 ), LEDs ( Ghosh et al., 1986 ; Huang et al., 1992 ; Kuo et al., 2010 ; Peng and Wu, 2004 ), as well as 2DESs with ultra-high carrier mobility ( Dingle et al., 1978 ; Hatke et al., 2017 ; Manfra, 2014 ; Pfeiffer et al., 1989 ; Umansky et al., 2009 ). For example, strained Si is now commonly found in every MOSFET ( Sun et al., 2007 ) due to the increased interatomic distance in the silicon layer that nearly doubles the mobility.…”
Section: Introductionmentioning
confidence: 99%
“…By reducing the defect density in the perovskite layer, controlling strain and crystal phase, and improving crystalline order, electronic properties can be enhanced and quantum devices can be developed. Indeed, the ability to exploit epitaxy and epitaxial strain in silicon (Si) and III-V semiconductors revolutionized modern computing and optoelectronics and led to improved photovoltaics ( Bertness et al., 1994 ; Dai et al., 2015 ; King et al., 2007 ; Lee et al., 2012a ; Takamoto et al., 1997 ), LEDs ( Ghosh et al., 1986 ; Huang et al., 1992 ; Kuo et al., 2010 ; Peng and Wu, 2004 ), as well as 2DESs with ultra-high carrier mobility ( Dingle et al., 1978 ; Hatke et al., 2017 ; Manfra, 2014 ; Pfeiffer et al., 1989 ; Umansky et al., 2009 ). For example, strained Si is now commonly found in every MOSFET ( Sun et al., 2007 ) due to the increased interatomic distance in the silicon layer that nearly doubles the mobility.…”
Section: Introductionmentioning
confidence: 99%
“…There are reports that the extraction efficiency for light upwardly emitted from the active region can be effectively improved by considering the top window layer, 2,3) transparent conductive layer, [4][5][6] surface texturing, 7,8) and nanosized materials 9,10) deposited on its surface. Additionally, a remarkable increment in the efficiency of AlGaInP LED was found in the GaP window with a carbon contact layer 11) and a zinc contact layer 12) fabricated by in situ growth and post-zinc diffusion, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…By reducing the defect density in the perovskite layer, controlling strain and crystal phase, and improving crystalline order, electronic properties can be dramatically enhanced and quantum devices can be developed. Indeed, the ability to exploit epitaxy and epitaxial strain in silicon (Si) and III-V semiconductors revolutionized modern computing and optoelectronics and led to improved photovoltaics [11][12][13][14][15], LEDs [16][17][18][19] as well as 2DESs with ultra-high carrier mobility [20][21][22][23][24]. For example, strained Si is now commonly found in every MOS-FET [25] due to the increased interatomic distance in the silicon layer that nearly doubles the mobility.…”
mentioning
confidence: 99%