2014
DOI: 10.7567/apex.7.102101
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Enhanced light extraction in GaN-based light-emitting diodes by evanescent wave coupling effect

Abstract: Subwavelength-sized truncated cones satisfying the requirement for evanescent wave coupling effect at the emission wavelength were fabricated on the p-side of a GaN-based blue light-emitting diode (LED). The light-extraction efficiency increased by a factor of approximately 2.2 relative to that of a reference LED with a flat light-extraction surface. This light-extraction enhancement ratio is much larger than that realized by using conventional light-extraction techniques. The evanescent wave coupling effect a… Show more

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Cited by 8 publications
(5 citation statements)
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References 25 publications
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“…For embossed LEDs, the obtained values for the OPE are significantly higher than those reported with other approaches involving add-on layers made at room temperature 18 and comparable to or higher than the values obtained with approaches which require recrystallization 2,15 or even GaN patterning. 6,8,[24][25][26] Further enhancement is also expected after encapsulation, compared to the OPE value reported in Ref.…”
supporting
confidence: 60%
“…For embossed LEDs, the obtained values for the OPE are significantly higher than those reported with other approaches involving add-on layers made at room temperature 18 and comparable to or higher than the values obtained with approaches which require recrystallization 2,15 or even GaN patterning. 6,8,[24][25][26] Further enhancement is also expected after encapsulation, compared to the OPE value reported in Ref.…”
supporting
confidence: 60%
“…It is believed that rough surface in LEDs structure would help to improve the LEE [30,31]. By examining Fig.…”
Section: Resultsmentioning
confidence: 99%
“…This could be due to production of defects in p-GaN during plasma etching. 38,39 In the meanwhile, nanoimprint lithography was employed, which is a novel way to form a nanostructure using ITO sol-gel on GaN-based LEDs. The advantages of this process include inhibition of etching-induced damages as well as easy formation of various nanostructures.…”
Section: Resultsmentioning
confidence: 99%