2013
DOI: 10.1021/jp403330d
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Enhanced Ionic Transport Mechanism by Gramicidin A Confined Inside Nanopores Tuned by Atomic Layer Deposition

Abstract: International audienc

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Cited by 40 publications
(66 citation statements)
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References 68 publications
(114 reference statements)
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“…[128] Atomic layer deposition (ALD) is gaining increasinga ttention in the energya nd environmental fields as ap romising methodf or surfacem odification and protection. [132][133][134][135] The originality of ALD was given to Professor Aleskovskii and his team in 1960 when they realizedt he deposition of TiO 2 from TiCl 4 and H 2 O. [132][133][134][135] The originality of ALD was given to Professor Aleskovskii and his team in 1960 when they realizedt he deposition of TiO 2 from TiCl 4 and H 2 O.…”
Section: Atomic Layer Depositionmentioning
confidence: 99%
“…[128] Atomic layer deposition (ALD) is gaining increasinga ttention in the energya nd environmental fields as ap romising methodf or surfacem odification and protection. [132][133][134][135] The originality of ALD was given to Professor Aleskovskii and his team in 1960 when they realizedt he deposition of TiO 2 from TiCl 4 and H 2 O. [132][133][134][135] The originality of ALD was given to Professor Aleskovskii and his team in 1960 when they realizedt he deposition of TiO 2 from TiCl 4 and H 2 O.…”
Section: Atomic Layer Depositionmentioning
confidence: 99%
“…Supported PAN nanobers with 240 seconds of (Table 1). 45,[47][48][49][50][51][52][53][54] XRD diffraction patterns of ZnO thin lms are shown in Fig. 2a.…”
Section: Inuence Of the Zno Thickness On Uv Photodetectionmentioning
confidence: 99%
“…In order to tackle these problems, the nanopore can be modified by atomic layer deposition (ALD) [34]. This method is particularly adapted to fashion nanopore since it permits (i) to coat identically and homogeneously the inside and the outside of the nanopore [35], (ii) to functionalize the surface with chemically active groups such as amine and (iii) to control precisely the nanopore diameter up to 1 nm [36].…”
mentioning
confidence: 99%