Graphene (Gr) has shown a significant role in photovoltaic
applications
due to its exclusive properties. In this study, we established a facile
approach to fabricate p-Gr/HfO2/n-silicon, a metal–insulator–semiconductor
(MIS) Schottky junction solar cell. Nevertheless, the poor work function
of Gr and high-density defect states at the Gr/Si interface obstruct
the efficiency of solar cells. To avoid this problem, the optimal
thickness of the interfacial layer (HfO2) is employed,
which circumvents the recombination process at the Gr/Si interface.
Additionally, to boost the Schottky barrier height and Gr’s
work function, a combination of p-type co-doping of organic molecule
2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4-TCNQ) and
Br is studied. Therefore, a higher work function aims to encourage
the built-in potential, which ultimately improves the open-circuit
voltage and current density and deteriorates the series resistance
of solar cells. Hence, a unique combination of dopants resulted in
improved efficiency of up to 12.31%. Moreover, devices with double
layer (MoO3/HfO2) passivation have been enabled
to provide outstanding stability for over 180 days. The combined effect
of p-type co-doping and double layer passivation developed a solar
cell having a significant efficiency of 14.01%. Thus, this work intends
to show a promising, high-performance and stable MIS Schottky junction
solar cell for massive commercialization of photovoltaic devices.