Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems

Rooij-Lohmann, V.I.T.A. de; Yakshin, Andrey; Kruijs, R. W. E. van de; Zoethout, E.; Kleyn, Aart W.; Keim, Enrico G.; Gorgoi, Mihaela; Schäfers, F.; Brongersma, H.H.; Bijkerk, Frederik

doi:10.1063/1.3460107

Cited by 19 publications

(12 citation statements)

References 21 publications

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“…Hence, as a logical follow-up, this work focused on the so far largely unknown chemical processes that occur in B 4 C-barriered Mo/Si layered structures. This paper also addresses another question arising in this framework, namely, how the chemical behavior of the compound B 4 C compares to its constituents B and C in elemental form.…”

Section: Introductionmentioning

confidence: 99%

“…Literature mostly considers B 4 C, describing its effectiveness to increase the stability of the structure without compromising the reflectivity. Recent work 4 concludes that B 4 C is chemically reactive with the adjacent Mo and Si layers, without identifying the exact process. Hence, as a logical follow-up, this work focused on the so far largely unknown chemical processes that occur in B 4 C-barriered Mo/Si layered structures.…”

Section: Introductionmentioning

confidence: 99%

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Chemical interaction of B4C, B, and C with Mo/Si layered structures

Rooij-Lohmann

Veldhuizen

Zoethout

et al. 2010

Journal of Applied Physics

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To enhance the thermal stability, B 4 C diffusion barrier layers are often added to Mo/Si multilayer structures for extreme ultraviolet optics. Knowledge about the chemical interaction between B 4 C and Mo or Si, however is largely lacking. Therefore, the chemical processes during annealing up to 600°C of a Mo/ B 4 C / Si layered structure have been investigated in situ with hard x-ray photoelectron spectroscopy and ex situ with depth profiling x-ray photoelectron spectroscopy. Mo/ B/Si and Mo/C/Si structures have also been analyzed as reference systems. The chemical processes in these systems have been identified, with two stages being distinguished. In the first stage, B and C diffuse and react predominantly with Mo. MoSi x forms in the second stage. If the diffusion barrier consists of C or B 4 C, a compound forms that is stable up to the maximum probed temperature and annealing time. We suggest that the diffusion barrier function of B 4 C interlayers as reported in literature can be caused by the stability of the formed compound, rather than by the stability of B 4 C itself.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Chemical interaction of B4C, B, and C with Mo/Si layered structures

Rooij-Lohmann

Veldhuizen

Zoethout

et al. 2010

Journal of Applied Physics

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“…One of the most suitable techniques for this task is Low Energy Ion Scattering (LEIS) of noble gas ions, which has a unique sensitivity to the topmost atomic layer. This makes it very useful for diffusion and growth studies [4][5][6][7], also in combination with X-ray Photoelectron Spectroscopy (XPS). Another advantage of LEIS -easy quantification of surface elemental coverage -comes from the usual absence of matrix effects, meaning that generally the low energy ion yield is independent on the surrounding matrix, i.e.…”

Section: Introductionmentioning

confidence: 99%

Double matrix effect in Low Energy Ion Scattering from La surfaces

Zameshin

Yakshin

Sturm

et al. 2018

Applied Surface Science

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Low Energy Ion Scattering (LEIS) has been performed on several lanthanum-based surfaces. Strong subsurface matrix effects-dependence of surface scattered He+ ion yield on the composition of subsurface layer-have been observed. The ion yield of He+ scattered by La differed by a factor of up to 2.5 for different surfaces, while only the La peak was visible in the spectra. To study these effects and enable surface quantification, He+ ion yields have been measured in a range of incident He+ energies from 1000 to 7500 eV for LaB6, La2O3, oxidized La and pure La surfaces. The investigation showed that as many as two simultaneous matrix effects are present, each one driven by a separate charge exchange mechanism. The first one is a resonant neutralization from the conduction band of La to an excited state of the He+ ion. It depends on the work function of the surface, which is lowered significantly when La interacts with O or B. The second mechanism is quasiresonant charge transfer between bound La levels and He 1s, which creates characteristic oscillations in the energy dependence of ion yields. The exact structure of the oscillations depends on small changes in binding energies of interacting La levels. This is the first time quasiresonant charge transfer is proven to be present in La. It is likely that La 5p orbitals participate in this resonance, which can be the first clear observation of a resonance between p and s orbitals in LEIS. This type of resonance was previously believed to be absent because of strong damping. We also demonstrated that despite the complex matrix effect precise measurements over a wide energy range allow quantification of the atomic composition of La-based surfaces.

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“…This phenomenon has been extensively studied as it influences tremendously the behavior of the thin film heterostructures and ultimately the performance of devices in different applications. HAXPES has proven to be very sensitive to diffusion and thus allowed very consistent tracking of the sharpness of interfaces in metal multilayers [41--43] as well as Heusler multilayers [44] and x--ray mirrors [45,46]. Here we chose to illustrate a case that concerns the stability of a typical multilayer heterostructure of Mo/B4C/Si applied in modern reflective optics.…”

Section: Multilayersmentioning

confidence: 99%

“…Here we chose to illustrate a case that concerns the stability of a typical multilayer heterostructure of Mo/B4C/Si applied in modern reflective optics. De Rooij--Lohmann et al [45] investigated this trilayer thin film system by a combination of techniques in order to determine the diffusion rate and behavior during annealing. HAXPES brought to the investigation its sensitivity to chemical interaction and extended probing depth properties which then allowed the characterization of the buried interfaces.…”

Section: Multilayersmentioning

confidence: 99%