Abstract:Based on recent discovery of high-rate reactive magnetron sputtering, which was a key requirement for production of coating industry, this study focused on enhanced deposition rate of TiO2 films for photo-induce hydrophilic applications. The TiO2 thin films were reactively sputtered, which a pulsed DC source, from high-purity (99.995%) titanium (Ti) target on glass and silicon (100) and wafer substrates. During the deposition, a mesh grid cover was installed on the sputtering source with varying argon gas flow… Show more
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