Enhanced anti-reductive properties of nano-flower shaped morphological TiO2/FTO bilayer films for a-Si based solar cells

Wang, Likun; Lv, Tingting; Yu, Jianyuan; Wang, Jixia; Zhao, Hongli

doi:10.1016/j.surfcoat.2018.12.101

Cited by 2 publications

(1 citation statement)

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“…Several optimization methods have been proposed and adopted to improve the photoelectric properties of the FTO film. Among them, depositing a metal layer on the surface of the FTO film is the widely used one [10,11] and many kinds of metals including Au [12], Cu [13], Pt [14,15] and Ag [16][17][18] have been studied. However, Ag is fairly popular because of its high electrical conductivity and reasonable price.…”

Section: Introductionmentioning

confidence: 99%

Preparation and Photoelectric Properties of Patterned Ag Nanoparticles on FTO/Glass Substrate by Laser Etching and Driving Layer Strategy

Huang

Zhang

et al. 2020

Acta Metall. Sin. (Engl. Lett.)

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An effective method based on laser etching and driving layer strategy was proposed to prepare patterned Ag nanoparticles (Ag NPs) on fluorine-doped tin oxide (FTO)/glass substrate and thus to enhance the photoelectric properties. This method successively included depositing an aluminum-doped zinc oxide (AZO) driving layer, laser etching, depositing an Ag layer, furnace annealing and laser removal. Different AZO and Ag layer thicknesses were adopted, and the surface morphology, crystal structure and photoelectric properties were investigated. An Ag NPs/FTO/glass sample without an AZO driving layer was prepared for comparison. It was found that furnace annealing of the Ag layer combined with the AZO driving layer, rather than that without the AZO driving layer, was more conducive to generating patterned Ag NPs. Using a 20-nmthick AZO layer and a 150-nm-thick Ag layer led to the formation of uniformly distributed Ag NPs being aligned along the laser-etched grooves to form a pattern. The as-obtained sample had the best comprehensive photoelectric property with an average transmittance of 79.95%, a sheet resistance of 7.11 Ω/sq and the highest figure of merit of 1.50 × 10 −2 Ω −1 , confirming the feasibility of the proposed method and providing enlightenment for related researches of transparent conductive oxide-based films.

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