Energy-resolved angular distributions of O+ ions at the radio-frequency-powered electrode in reactive ion etching

Janes, Joachim; Huth, Christoph

doi:10.1116/1.577869

Cited by 26 publications

(15 citation statements)

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“…The ion mean free path can be determined from equation (7), in which k B denotes the Boltzmann constant, T g the gas temperature, p the pressure and σ the ion-neutral charge exchange collision cross section:…”

Section: Evaluation Of Current-voltage Characteristicsmentioning

confidence: 99%

“…Several experimental and theoretical methods have been developed and applied to determine the ion flux and the ion energy distribution at the substrate, such as the use of ion mass/energy analyzers [7][8][9] or extensive modelling of plasma and sheath [10][11][12][13][14]. Among the experimental methods, retarding field analyzers (RFAs) have gained a lot of interest due to their ease of use and simple implementation.…”

Section: Introductionmentioning

confidence: 99%

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Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: geometrical transparency and collisional effects

Baloniak¹,

Reuter²,

Flötgen³

et al. 2010

J. Phys. D: Appl. Phys.

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Retarding field analyzers (RFAs) are important diagnostics to measure fluxes and energies of ions impinging onto the wall of a plasma reactor. Any quantitative use of the data requires a proper calibration, which is here performed for a miniaturized RFA. The calibration accounts for the transparencies of the RFA grids as well as for collisions inside the RFA. An analytical model is derived which covers both geometrical and collisional effects. The model is calibrated and experimentally verified using a Langmuir probe. We find that the transparency of an RFA is a random variable which depends on the individual alignment of the RFA grids. Collisions inside the RFA limit the ion current transfer through the RFA at higher pressures. A simple method is presented which allows one to remove these artefacts from the RFA data and to obtain quantitative ion velocity distributions.

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Section: Evaluation Of Current-voltage Characteristicsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: geometrical transparency and collisional effects

Baloniak¹,

Reuter²,

Flötgen³

et al. 2010

J. Phys. D: Appl. Phys.

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“…Subsequently, the measurement of ion kinetic-energy distributions (IEDs) in low pressure, rf discharges generated in parallel-plate reactors has been used to investigate: (1) ion bombardment of the grounded electrode in argon plasmas [5–10]; (2) the role of ions in discharges sustained in etching gases [11–13]; (3) the angular distribution of ions striking the electrodes [14,15]; and (4) the effect of symmetric charge-transfer collisions on the shapes of IEDs [16]. Additional experiments have been performed to measure the energies of ions striking the surface of the powered electrode in capacitively coupled rf discharges [13,15, 17–19].…”

Section: Introductionmentioning

confidence: 99%

“…Additional experiments have been performed to measure the energies of ions striking the surface of the powered electrode in capacitively coupled rf discharges [13,15, 17–19]. …”

Section: Introductionmentioning

confidence: 99%

Studies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference Rf Reference Cell

Olthoff¹,

Brunt²,

Radovanov³

1995

J. Res. Natl. Inst. Stand. Technol.

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A review is presented of kinetic-energy distribution measurements for ions striking grounded surfaces in a Gaseous Electronics Conference (GEC) rf Reference Cell. Two experimental arrangements that have been used to measure ion energies in the GEC Cell are described, and a comparison of their performance under different operating conditions is presented. Significant results from ion-energy analysis in the Reference Cell are highlighted, including evidence of effects due to surface conditions on ion sampling, verification of electrical behavior of the cell, inferences about ion-molecule reactions indicated by the shapes of measured ion kinetic-energy distributions (IEDs), and the use of measured IEDs for the validation of theoretical models. The paper concludes with a detailed study of IEDs measured for rf plasmas generated in mixtures of argon and oxygen, using both experimental arrangements.

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“…The development of floating [6][7][8][9][10] and radio frequencyfiltered [11] retarding field analyzers (RFAs) has delivered deep insight into the ion bombardment of sinusoidally biased electrodes. Some authors have reported on the use of ion mass/energy analyzers behind sinusoidally biased electrodes [6,12,13]. The observed ion energy distributions are typically bimodal and span a broad energy band.…”

Section: Introductionmentioning

confidence: 99%

Fundamental aspects of substrate biasing: ion velocity distributions and nonlinear effects

Baloniak¹,

Reuter²,

Keudell³

2010

J. Phys. D: Appl. Phys.

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Ion bombardment of the substrate is a significant parameter in plasma processing such as dry etching or thin film deposition. The ion bombardment is described by ion velocity distribution functions (IVDFs), which were here measured quantitatively at a sinusoidally and non-sinusoidally biased electrode. The electrode voltage was monitored and controlled in the frequency domain using fast Fourier transformation. IVDF measurements were performed by a floating retarding field analyzer. A full modulation of the IVDF by arbitrary bias waveforms is only achieved if sufficiently high sheath voltages are used. If the applied sheath voltages become too low, the IVDFs are only partly determined by the RF bias waveforms and the system response becomes nonlinear. An analytical sheath model is derived from the experimental data, which accounts for arbitrary bias waveforms as well as for collisional and nonlinear effects in the sheath. It is shown that a combined DC and RF biasing of the electrode is required to gain full control over the ion bombardment of the substrate.

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Energy-resolved angular distributions of O+ ions at the radio-frequency-powered electrode in reactive ion etching

Cited by 26 publications

References 0 publications

Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: geometrical transparency and collisional effects

Calibration of a miniaturized retarding field analyzer for low-temperature plasmas: geometrical transparency and collisional effects

Studies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference Rf Reference Cell

Fundamental aspects of substrate biasing: ion velocity distributions and nonlinear effects

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