2013
DOI: 10.1063/1.4813878
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Energy level(s) of the dissociation product of the 1.014 eV photoluminescence copper center in n-type silicon determined by photoluminescence and deep-level transient spectroscopy

Abstract: The annealing behavior of copper centers in n-type silicon diffused with dilute copper was measured by photoluminescence (PL) and deep-level transient spectroscopy (DLTS) to investigate the energy level (or levels) of the dissociation product center of the 1.014 eV PL copper center. Among several DLTS peaks that appeared by the annealing, only the energy level at Ec − 0.16 eV (Ec: bottom energy of the conduction band) was suggested as the double acceptor level of the dissociation product center. From the disag… Show more

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Cited by 3 publications
(1 citation statement)
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“…The behavior of Cu in Si has been considered extensively by experimentalists [40][41][42][43][44] as well as by theoreticians [45][46][47][48][49][50][51][52][53][54][55][56][57]. For a long time, the Cu concentration that was detrimental to device performance was uncertain, and reliable techniques for measuring the Cu contamination level was unavailable [19].…”
Section: Introductionmentioning
confidence: 99%
“…The behavior of Cu in Si has been considered extensively by experimentalists [40][41][42][43][44] as well as by theoreticians [45][46][47][48][49][50][51][52][53][54][55][56][57]. For a long time, the Cu concentration that was detrimental to device performance was uncertain, and reliable techniques for measuring the Cu contamination level was unavailable [19].…”
Section: Introductionmentioning
confidence: 99%