Energy deposition in N and N+ by high-energy electron beams

Abstract

A discrete, time-dependent energy deposition model is used to study high-energy electron-beam (100 eV–10 MeV) deposition in N and N+. Both time-dependent and steady-state secondary electron distributions are computed. The loss function, mean energies per electron-ion pair production (W), production efficiencies, and distribution functions are presented for a wide range of energies. The latest experimental and theoretical cross sections are used in the model which predicts that W is approximately 31 eV for N and 72 eV for N+ over a wide range of beam energies. The sensitivity of these results to assumed background ionization fractions is also investigated.

Analysis of DC magnetron discharges in Ar- gas mixtures. Comparison of a collisional-radiative model with optical emission spectroscopy

“…Ionization processes for atomic nitrogen had been considered for the ground state N( 4 S) and for the two metastable states N( 2 D) and N( 2 P). The differential ionization cross-sections were taken from Taylor et al [13].…”

Study of optical emission spectroscopy using modified Boltzmann plot in dual-frequency synchronized pulsed capacitively coupled discharges with DC bias at low-pressure in Ar/O2/C4F8 plasma etching process

“…Note that the computed rate coefficients are comparable (not shown) with those reported by Taylor and Ali. 53 The figures also show the values of the fitting parameters y and z. The details of the fitting parameters for emission lines that determine the d 1u (p u ) value in the modified Boltzmann plot (eqn (11)) are summarized in Table 2.…”

“…The term L pl corresponds to the effective plasma length for the emitted light radiation to travel, which is a constant for a given operating condition. We assume that the free electrons obey the Maxwellian EEDF so that we can express the rate coefficient k 1u (p u ) for Ar as follows 53 where the term Z eff corresponds to the effective charge/atomic number (= 1 for Ar + ion), c 1u represents a constant (≅1), and f lu represents the absorption oscillator strength. 54 The other terms are u a = 13.6 k B T e (eV), u 1u = ( E 1 − E u )/ k B T e , and β 1u = 1 + [( Z eff − 1)/( Z eff + 1)].…”

“…54 The other terms are u a = 13.6 k B T e (eV), u 1u = ( E 1 − E u )/ k B T e , and β 1u = 1 + [( Z eff − 1)/( Z eff + 1)]. We take the help of Taylor and Ali's work 53 to determine the function ξ a ( u 1u , β 1u ) as…”

“…54 The other terms are u a = 13.6k B T e (eV), u 1u = (E 1 À E u )/k B T e , and b 1u = 1 + [(Z eff À 1)/(Z eff + 1)]. We take the help of Taylor and Ali's work 53 Table 2 Details of radiative transitions, the sum of transition probabilities, and fitting parameters corresponding to the Ar lines in Table 1 used in this work…”