Energy-density and repetition-rate dependences of the KrF-excimer-laser-induced 1.9-eV emission band in type-III fused silicas

Abstract

The energy-density and repetition-rate dependences of the intensity of KrF-excimer-laser (5.0 eV) -induced 1.9-eV emission band in type-III fused silicas synthesized under different conditions were investigated. The intensity of the 1.9-eV band is proportional to the 1.7-th power of the energy density and the 0.6-th power of the repetition rate of the laser pulse. The origin of these dependencies was discussed based on the trapped-oxygen-molecule model proposed by Awazu and Kawazoe; by irradiating with the excimer laser, ozone molecules are formed from dissolved oxygen molecules and 1.9-eV photons are emitted in the course of the photodecomposition of the ozone molecules. Therefore, a two-step photonabsorption process is needed to emit the 1.9-eV photon. To form the ozone molecule, diffusion of the oxygen atoms produced by the photodecomposition of the trapped oxygen molecules are needed. This model suggests that the intensity of the 1.9-eV band is proportional to the square of the energy density and the square root of the repetition rate; this dependency is nearly the same as that of our experimental result.

X-ray induced luminescence of high-purity, amorphous silicon dioxide

“…The red line at about 1.9 eV has been especially well studied. [5][6][7][8][9][10] It has been observed in samples which had previously been irradiated by ultraviolet light, [11][12][13] ionizing photon radiation ͑x rays and gamma rays͒, [14][15][16][17][18] neutrons, 6,8 and ions. 19 This line has been observed in samples which had been subjected to stresses from drawing, 20 bending, 21 and fracture.…”

Effects of preirradiation and thermal annealing on photoinduced defects creation in synthetic silica glass

“…For example, it is indispensable for lithography in ultralarge scale integrated circuits ͑ULSI͒ processes using KrF-excimer laser at 248 nm. [1][2][3] However, numerous efforts to improve the UV transmission property in silica glass are still continuing, since optical components with higher transmittance and better UV-proof property are highly desired for various applications. Lithography using ArF-excimer laser at 193 nm and medical applications using UV fiber are some examples.…”