Endurance Test of Microwave Engine

Kim, S.-W.; Okamoto, Hiroyuki; Sugiki, Ted Mitsuteru; Itoh, Yasumasa; Satori, Shin; Nam, Minwoo

doi:10.2514/1.17214

Cited by 4 publications

(3 citation statements)

References 2 publications

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“…Because the antenna itself is immersed in the plasma, however, it is subject to bombarding flux from the plasma generated in its local vicinity, which leads to erosion and which ultimately limits total operating lifetime. 22 In this regard, while insert issues have been circumvented, physical sputtering of the antenna is a potential life limiter for this configuration. The sputtering energy is not only a function of the local plasma density and electric field intensity at the antenna but also the electron extraction voltage.…”

Section: Plasma Cathode Theory and Experimental Approachmentioning

confidence: 99%

Performance and analysis of an electron cyclotron resonance plasma cathode

Hidaka

Foster

Getty

et al. 2007

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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A scalable electron cyclotron resonance ͑ECR͒ plasma source was investigated for plasma cathode applications. The rectangular source utilized permanent magnets to establish the ECR condition. The microwave applicator region was windowless, making the source applicable to sputtering environment applications. The source was characterized using primarily two diagnostics: ͑1͒ a near-field and far-field Langmuir probe and ͑2͒ a downstream electron extraction electrode. Source operation and plasma properties were characterized at low pressures ranging from 0.2 to 5 mTorr and power levels up to 250 W. Evidence of grad-B drift in the plane of the source was observed. Extracted currents agreed well with predictions.

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Section: Plasma Cathode Theory and Experimental Approachmentioning

confidence: 99%

Performance and analysis of an electron cyclotron resonance plasma cathode

Hidaka

Foster

Getty

et al. 2007

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…To realize a cusp accelerator device, microwave driven electron cyclotron resonance (ECR) was investigated as the plasma production mechanism within the cusp. ECR plasmas have many distinct advantages over traditional DC, hollow cathodebased sources 3,4 . These include electrodeless plasma production and instant on operation.…”

Section: Microwave Ecr Cusp Acceleratormentioning

confidence: 99%

Characterization of Ion Acceleration Processes in a Surface ECR Plasma Source

Sommers

Foster²

2008

44th AIAA/ASME/SAE/ASEE Joint Propulsion Conference &Amp;amp; Exhibit

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A microwave ECR ion source is developed using distributed ECR antenna excitation over the cusp of a permanent multipole magnetic configuration. The ion source employs a combination of natural nozzle acceleration effects occurring within the cusp and the application of an external DC bias to extract both electron and ion current from the device. The ECR discharge is shown to be stable over the pressure range 0.5-100 mTorr and at low pressure (1.4 mTorr), beam energies up to 80 eV are observed. In this paper, we present both current extraction and ion beam energy measurements taken over the pressure range 1-20 mTorr and power levels between 20 and 40 W. In addition, beam energy and beam energy spread are documented and correlated to discharge voltage.

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“…icrowave plasma sources driven by electron cyclotron resonance (ECR) have become established as viable plasma sources for applications in electric propulsion, primarily in the development of gridded ion thrusters 1,2 . ECR plasmas have many distinct advantages over traditional DC, hollow cathode-based sources 3,4 . These include electrodeless plasma production and instant on operation.…”

Section: Introductionmentioning

confidence: 99%