Ellipsometric studies of the absorption of liquid by photo resist

Evaporation of water droplets on photoresist surfaces – An experimental study of contact line pinning and evaporation residues

“…[41][42][43] showed that no watermark defects occur, if droplets are removed by airjet blowing before complete evaporation, which indicates that the terminal phase of the evaporation process is the detrimental one. 44 Near complete evaporation, any dissolved components that have been leached from the photoresist [15][16][17]19,45,46 during the lifetime of the droplet are strongly enriched in concentration. Ishibashi et al performed a TOF-SIMS analysis of the drying residues of water droplets on immersion resists and found a significant enhancement of the PAG concentration.…”

“…The water uptake dy-namics and film thickness increase ∆h of PR layers upon water immersion has been measured using ellipsometry or the quartz crystal microbalance method. [13][14][15] Typical values of ∆h are in the few percent range. Due to its high static dielectric constant, water readily dissolves polar and dissociating compounds.…”