Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation

Herzinger, C. M.; Johs, B.; McGahan, William A.; Woollam, John A.; Paulson, W. M.

doi:10.1063/1.367101

Cited by 990 publications

(636 citation statements)

References 26 publications

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“…Relative errors are considerably smaller, less than half, making analysis of trends meaningful. For the refractive index, the error is based on the 90% confidence limits for fitted parameters [16].…”

Section: Resultsmentioning

confidence: 99%

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Aiempanakit

Helmersson

Aijaz

et al. 2011

Surface and Coatings Technology

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The effect of peak power in a high power impulse magnetron sputtering (HiPIMS) reactive deposition of TiO 2 films has been studied with respect to the deposition rate and coating properties. With increasing peak power not only the ionization of the sputtered material increases but also their energy. In order to correlate the variation in the ion energy distributions with the film properties, the phase composition, density and optical properties of the films grown with different HiPIMS-parmeters have been investigated and compared to a film grown using direct current magnetron sputtering (DCMS). All experiments were performed for constant average power and pulse on time (100W and 35 μs, respectively), different peak powers were achieved by varying the frequency of pulsing. Ion energy distributions for Ti and O and its dependence on the process conditions have been studied. It was found that films with the highest density and highest refractive index were grown under moderate HiPIMS conditions (moderate peak powers) resulting in only a small loss in massdeposition rate compared to DCMS. It was further found that TiO 2 films with anatase and rutile phases can be grown at room temperature without substrate heating and without postdeposition annealing.

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Section: Resultsmentioning

confidence: 99%

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Aiempanakit

Helmersson

Aijaz

et al. 2011

Surface and Coatings Technology

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“…The adequate model for interpretation of experimental data was constructed in the multi-layer structure making use of reference data for dielectric function of SiO 2 [10], bulk Fe [11], and Fe oxides Fe 2 O 3 [12] and Fe 3 O 4 [13]. The effective dielectric function ε eff of the Fe-doped silica film was determined in terms of the effective media model [14], combining the relative contributions of materials and voids.…”

Section: Resultsmentioning

confidence: 99%

Controlled formation of Fe nanoparticles in silica

Šimkienė¹

2006

Lithuanian J. Phys.

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The SiO2:Fe films on Si substrates were produced by sol-gel and spinning techniques. Hybrid organic-inorganic precursor (tetraethoxysilane-FeCl3) and organic alkoxide precursor modified from Fe acetate were used. The Fe nanoparticles have been formed by various technological procedures. The structural, magnetic and optical characteristics of (SiO2:Fe) / Si samples depending on technology of sample preparation were examined. The size of Fe nanoparticles was shown to be controlled by precursor preparation procedure. It was found that Fe-containing nanocrystals of average size ∼40 nm were formed by "one-pot" technique from the mixture of solutions containing Fe salts and freshly prepared colloidal tetraethoxysilane (TEOS). In contrast, in the "two-pots" procedure, the components of precursor were prepared non-simultaneously and the structurized TEOS sol was used. In the latter case, Fe nanoparticles were distributed in size over a larger range with a mean value at ∼25 nm. It was hence concluded that precursor-controlled formation of Fe nanoparticles can be achieved using different sol-gel technological procedures.

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“…The applied ellipsometric model consisted of the silicon substrate (optical data from 33 ), the native oxide layer and the peptide layer.…”

Section: Ellipsometric Evaluation Of Peptide Layersmentioning

confidence: 99%

Interactions at the Peptide/Silicon Surfaces: Evidence of Peptide Multilayer Assembly

et al. 2016

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Selective deposition of peptides from liquid solutions to n-and p-doped silicon has been demonstrated. The selectivity is governed by peptide/silicon adhesion differences. A noninvasive, fast characterization of the obtained peptide layers is required to promote their application for interfacing silicon-based devices with biological material. In this study we show that spectroscopic ellipsometry -a method increasingly used for the investigation of biointerfaces -can provide essential information about the amount of adsorbed peptide material and the degree of coverage on silicon surfaces. We observed the formation of peptide multilayers for a strongly binding adhesion peptide on p-doped silicon. Application of the patterned layer ellipsometric evaluation method combined with Sellmeier-dispersion led to physically consistent results, which describe well the optical properties of peptide layers in the visible spectral range.This evaluation allowed the estimation of surface coverage, which is an important indicator of adsorption quality. The ellipsometric findings were well supported by atomic force microscopy results.

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Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation

Cited by 990 publications

References 26 publications

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide

Controlled formation of Fe nanoparticles in silica

Interactions at the Peptide/Silicon Surfaces: Evidence of Peptide Multilayer Assembly

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