“…[2][3][4][5][6] Recently,s cattered layerso fS nS on either mica or Si wafer, prepared fromc ommercialS nS powers via av apor phase transportm ethod, have been successfully used in variousa pplications such as the field effect transistors, [14,15] anisotropic field-effect transistors, [5] solid-ionb atteries (chemically derived SnS), [16] near-infraredp hotodetectors, [17] gas dependentp hotodetectors, [18] and anisotropic core-shell photoactive heterostructures. [19] Such diverse applicationso fS nS layers reflect the inherentf unctional richness of the SnS layers such as 2D anisotropic optical, electrical and thermoelectric properties of SnS [5,6,10,20] as has been experimentally determinedf rom the thickness, angle, and temperature-dependent Raman characteristics. [5,21] Various functional devices employing 2D SnS materials have been prepared using chemical routes [10,[22][23][24][25][26][27][28] as well as vacuum routes.…”