Ellipsoid–hyperboloid x-ray imaging instrument for laser-pellet diagnostics

Abstract

Analysis of an x-ray imaging system employing ellipsoid and hyperboloid mirrors that are confocal and coaxial indicates that spatial resolution of 1-3 microm can be obtained. The useful field of view is hundreds of microns, and the collecting solid angle is at least 10(3) times that of a pinhole camera. The instrument has application to the diagnostics of laser-pellet interactions.

New Methods in Development of X-Ray Optics for Plasma Diagnostics of Laser - Produced Plasma

“…We nave participated in 7 space X-ray imaging experiments. 6 experiments were flown onboard the Vertical 8, 9 and 11 rockets in the years 1979, 1981and 1983, one experiment was flown onboard the Soviet orbital station Salyut 7 in the year 1982 (Valnicek et al 1983 andHudec et al 1984b). The experiments represent both small solar X-ray imaging telescopes and big stellar X-ray telescope.…”

“…The use of grazing incidence imaging X-ray mirrors represents much tetter possibility to get diagnostic images of laser-produced plasmas. For laboratory experiments, the most advantageous system seems to be ellipsoid-hyperboloid mirror because of finite distance of the source (Chase and Silk 1975). In recent years, there have teen efforts at several laboratories aimed to the development of such X-ray microscopic optical systems (Silk 1980).…”

Axisymmetric grazing-incidence focusing optics for small-angle neutron scattering

“…We propose and analyze the use of axisymmetric Wolter-type mirrors, which are commonly utilized in x-ray astronomy and microscopy [11][12][13][14]. Neutron Wolter mirrors have been recently demonstrated by our group [15,16].…”

An alternative optical design for x-ray telescopes

“…A variation of the type I Wolter design [16], [17], in which the parabolic surface is replaced by an ellipsoid, has found application for collecting the radiation at 13.5 nm emitted from a small hot plasma used as a source in Extreme UltraViolet (EUV) microlithography [18]- [21], currently considered a promising technology in the semiconductor industry for the next generation lithographic tools. More recently, a new optical design has recently been proposed [22], [23] in which the above condition on the two reflection angles is satisfied for all rays incident on each mirror.…”