Elemental composition analysis of silicon carbonitride thin films by energy dispersive spectroscopy

Rumyantsev, Yu. M.; Файнер, Н. И.; Maximovskii, E. A.; Ayupov, B. M.

doi:10.1007/s10947-010-0210-0

Cited by 8 publications

(3 citation statements)

References 19 publications

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“…It is known that EDS is a semi‐quantitative and not much precise method to determine the element concentrations at thin films. There are additional difficulties in EDS analysis of N‐DLC films: carbon and nitrogen elements are light and have close atomic numbers . Despite these limitations, our results demonstrated (Table ) that EDS analysis is a good method to assess qualitatively the chemical composition of the films.…”

Section: Resultsmentioning

confidence: 99%

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Leal

Fraga

Rasia³

et al. 2016

Surf. Interface Anal.

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a Because of their outstanding characteristics, diamond-like carbon (DLC) thin films have been recognized as interesting materials for a variety of applications. For this reason, the effects of the incorporation of different elements on their fundamental properties have been the focus of many studies. In this work, nitrogen-incorporated DLC films were deposited on Si (100) substrates by DC magnetron sputtering of a graphite target under a variable N 2 gas flow rate in CH 4 + N 2 + Ar gas mixtures. The influence of high N 2 flow ratios (20, 40 and 60%) on the chemical, structural and morphological properties of N-DLC films was investigated. Different techniques including field emission gun-equipped scanning electron microscope (FEG-SEM), energy-dispersive X-ray spectroscopy (EDS), atomic force microscopy (AFM), profilometry, Rutherford backscattering spectrometry (RBS) and Raman spectroscopy (325-nm and 514-nm excitation) were used to examine the properties of the N-DLC films. Thus, the incorporation of nitrogen was correlated with the morphology, roughness, thickness, structure and chemical bonding of the films. Overall, the results obtained indicate that the fundamental properties of N-DLC films are not only related to the nitrogen content in the film but also to the type of chemical bonds formed.

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Section: Resultsmentioning

confidence: 99%

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Leal

Fraga

Rasia³

et al. 2016

Surf. Interface Anal.

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show abstract

“…The obtained results prove the conclusions The elemental composition of the films was determined by the method of energy dispersive spectroscopy. For more validity of the results of elemental analysis only those values of the electron beam energy (~5-7 keV) and thickness of the film (500-600 nm) were used, which we found to be optimal in the course of the performed investigation [64]. The data obtained are given below.…”

Section: Determination Of Chemical Phase Compositions and Types Of mentioning

confidence: 99%

From organosilicon precursors to multifunctional silicon carbonitride

Файнер

2012

Russ J Gen Chem

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Films of silicon carbonitride of variable composition are prepared by the method of plasmochemical decomposition of tetramethyldisilazane, hexamethyldisilazane, and hexamethylcyclotrisilazane in the mixture with helium in the temperature range of 373-973 K. The chemical composition of the low temperature films (373-673 K) is described by the formula SiC x N y O z :H, whereas that of high temperature films, by the formula SiC x N y . The films of silicon carbonitride are found to be a nanocomposite material containing an amorphous part and nanocrystals, whose structure is close to the phase α-Si 3 N 4 . Films of the composition SiC x N y O z :H are promising as low-k interlayer dielectrics in ultra-large scale integrated circuits of new generation, as well as protecting antireflective coatings and light-emitting diodes.Nowadays more severe requirements are imposed on the quality of construction materials used in many fields of science and technology. New materials are necessary stable to high temperatures, mechanical wear, abrasion, corrosion and oxidation [1]. That is why various methods are intensively developed for the synthesis of refractory superhard coatings (hardness > 20 GPa), which have long lifetime, enhanced hardness, and are relatively cheap [2]. For example, coatings are made of materials alternative to the expensive diamond coatings. Binary solid compounds like SiC, TiC, TiN can provide an enhanced wear stability, but hardly can possess a wide variety of functional properties.Recent research has shown that coatings on the basis of ternary compounds exceed in their functional properties the coatings based on binary compounds [3]. One of promising ternary materials is silicon carbonitride. It possesses new properties as compared with crystalline binary compounds Si 3 N 4 and SiC. Films of silicon carbonitride possess an exclusive combination of physicochemical properties like high thermal conductivity, thermal stability (up to 1500°C), resistance to oxidation, high hardness, chemical inertness, that makes them ideal wear-and corrosionstable materials for applications in aggressive media, for high-temperature industrial and strategic applications [4][5][6][7][8][9][10]. It is assumed that a high thermal, chemical, and mechanical stability is achieved due to the absence of boundaries between the grains and of the oxides as secondary phases in these coatings. Besides, such properties as low density and good thermal shock resistance, are very important in the future for aerospace, automobile, and other fields of industry. It is known that stainless steel possessing high corrosive stability is rusted when stored for a long time in the open air because of acid rains. To prevent this process, the steel must be coated, for example, with a transparent solid film, like the film of silicon carbonitride [11]. In general, films of silicon carbonitride can be used in various applications, not only as barrier isolating layers, films for protection of flat panel displays, but also for general industrial application.Ad...

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“…In EDS, it is important to have a standard sample for calibration with chemical composition, crystalline structure, smooth surface and phase that is close to the sample that is going to be assessed (Rumyantsev et al 2010). In this experiment, hematite (Fe2O3) was used as a calibration for the BFS.…”

Section: Energy Dispersive Spectroscopy (Eds)mentioning

confidence: 99%

Investigation of thermal properties of blast furnace slag to improve process energy efficiency

Yasipourtehrani

Strezov

Bliznyukov

et al. 2017

Journal of Cleaner Production

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Elemental composition analysis of silicon carbonitride thin films by energy dispersive spectroscopy

Cited by 8 publications

References 19 publications

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

From organosilicon precursors to multifunctional silicon carbonitride

Investigation of thermal properties of blast furnace slag to improve process energy efficiency

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Elemental composition analysis of silicon carbonitride thin films by energy dispersive spectroscopy

Cited by 8 publications

References 19 publications

Impact of high N2flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Impact of high N2flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

From organosilicon precursors to multifunctional silicon carbonitride

Investigation of thermal properties of blast furnace slag to improve process energy efficiency

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Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films

Impact of high N₂flow ratio on the chemical and morphological characteristics of sputtered N-DLC films