2006
DOI: 10.1016/j.snb.2006.04.038
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Electrostatic shutter design for a miniaturized ion mobility spectrometer

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Cited by 19 publications
(9 citation statements)
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“…Portion of ions is introduced into the drift region through a shutter grid, constituting a kind of electrostatic valve, which separate the ion reactor from the drift space. Electric field in vicinity of the grid is not uniform and is variable in time [10]. If distance between the grid electrodes is comparable with space covered by ions in time equal to gating pulse duration, initial distribution of ion concentration significantly differs from one-dimensional rectangular distribution.…”
Section: Introductionmentioning
confidence: 99%
“…Portion of ions is introduced into the drift region through a shutter grid, constituting a kind of electrostatic valve, which separate the ion reactor from the drift space. Electric field in vicinity of the grid is not uniform and is variable in time [10]. If distance between the grid electrodes is comparable with space covered by ions in time equal to gating pulse duration, initial distribution of ion concentration significantly differs from one-dimensional rectangular distribution.…”
Section: Introductionmentioning
confidence: 99%
“…Several researchers have investigated how the change of the electrical field around the ion shutter will influence the performance of the IMS [11][12][13][14][15][16][17]. Eiceman et al systematically studied the effect of the influence and the importance of optimizing electric fields in each region of an IMS drift tube by experimental and simulation methods.…”
Section: Introductionmentioning
confidence: 99%
“…Salleras et al have made an ion shutter for miniaturized ion mobility spectrometers by bulk silicon micromachining and optimized its parameters, such as electrode geometry and applied voltage [14]. Zhou shutter.…”
Section: Introductionmentioning
confidence: 99%
“…For example, many microfluidic devices are built using layers of glass, metal, and polymer materials. Although a variety of efficient methods have been developed to build B-N shutters [10][11], integration of the shutter means fabricating it 'off-chip' and then positioning it relative to the drift chamber. Microfabrication should streamline the fabrication of a device, and any effort to position and align a traditional B-N shutter with the drift chamber of an IMS after it has been fabricated is impractical and introduces additional complications.…”
Section: Introductionmentioning
confidence: 99%