2006
DOI: 10.1063/1.2354483
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Electrostatic force microscopy as a tool to estimate the number of active potential barriers in dense non-Ohmic polycrystalline SnO2 devices

Abstract: In the present work, electroactive grain boundaries of highly dense metal oxide SnO2-based polycrystalline varistors were determined by electrostatic force microscopy (EFM). The EFM technique was applied to identify electroactive grain boundaries and thus estimate the amount of active grain boundary, which, in the metal oxide SnO2-based varistor, was calculated at around 85%, i.e., much higher than that found in traditional metal oxide ZnO-based varistors. The mean potential barrier height value obtained from … Show more

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Cited by 35 publications
(23 citation statements)
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“…Such approach was tested in a highly dense SnO 2 -based polycrystalline semiconductor. Therefore, the value of mean potential barrier height obtained was found to be about 1.4 V. 29 The comparison of this value obtained from EFM with that value obtained from a complex capacitance analysis according to the approach previously discussed is shown in Table 5. The other parameters of the system are still shown in this table, for instance, nonlinear coefficient value and electric breakdown field.…”
Section: Electrostatic Force Microscopy and Admittance Spectroscopymentioning
confidence: 69%
See 2 more Smart Citations
“…Such approach was tested in a highly dense SnO 2 -based polycrystalline semiconductor. Therefore, the value of mean potential barrier height obtained was found to be about 1.4 V. 29 The comparison of this value obtained from EFM with that value obtained from a complex capacitance analysis according to the approach previously discussed is shown in Table 5. The other parameters of the system are still shown in this table, for instance, nonlinear coefficient value and electric breakdown field.…”
Section: Electrostatic Force Microscopy and Admittance Spectroscopymentioning
confidence: 69%
“…From the pattern of capacitive potential energy obtained from electrostatic force microscopy (EFM) technique as a function of the applied voltage, 29 it is possible to obtain the minimum voltage value corresponding to the mean value of potential barrier height for the active junctions. Such approach was tested in a highly dense SnO 2 -based polycrystalline semiconductor.…”
Section: Electrostatic Force Microscopy and Admittance Spectroscopymentioning
confidence: 99%
See 1 more Smart Citation
“…As the CuO concentration increases above 0.2 mol %, the nonlinear coefficient decreases. According to the previous work [22], the decreasing nonlinear coefficient might be associated to the reduction of the effective grain boundary. On the contrary, The leakage current density decreases firstly with the CuO concentration increasing from 0 to 0.2 mol %, and then increases gradually with the CuO concentration further increasing from 0.2 to 0.6 mol %.…”
mentioning
confidence: 74%
“…based varistor the active potential barrier ranges from 15-35% [24][25] and SnO 2 -based varistor 85% of the grain-to-grain junctions were active potential barriers [26][27] . For the sample with x = 0.5, the increase in the capacitance with bias voltage can be related to degradation in the nonohmic properties involving a distortion of the Schottky barriers at intergrains.…”
Section: Resultsmentioning
confidence: 99%