1991
DOI: 10.1111/j.1151-2916.1991.tb04108.x
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Electrostatic Adsorption of a Colloidal Sintering Agent on Silicon Nitride Particles

Abstract: Pressureless sintering of silicon nitride requires addition of sintering agents. The main part of this study was done in order to homogenize the distribution of sintering agents, in this case Y z 0 3 , in a silicon nitride matrix. Colloidal 10-nm Y203 particles were electrostatically adsorbed on SiJN4 particle surfaces. The adsorption was studied by X-ray fluorescence analysis and electrophoretic measurements. Addition of Y2O3 sol to a Si3N4 suspension decreased the viscosity of the suspension. The slip castin… Show more

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Cited by 56 publications
(20 citation statements)
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“…The as‐received Si 3 N 4 powders in water alone show an isoelectric point (IEP) of ~5 pH, and the largest magnitude potentials are observed at ~2.5 pH and ~9 pH, of 30 and −25 mV, respectively. This matches with similar research finding an IEP of silicon nitride from 4 to 7 pH . The IEP of Si 3 N 4 can vary greatly based on the ratio of basic amine to acidic silanol groups present in the surface, the amounts of each varied by pretreatments of starting powders .…”
Section: Resultssupporting
confidence: 91%
“…The as‐received Si 3 N 4 powders in water alone show an isoelectric point (IEP) of ~5 pH, and the largest magnitude potentials are observed at ~2.5 pH and ~9 pH, of 30 and −25 mV, respectively. This matches with similar research finding an IEP of silicon nitride from 4 to 7 pH . The IEP of Si 3 N 4 can vary greatly based on the ratio of basic amine to acidic silanol groups present in the surface, the amounts of each varied by pretreatments of starting powders .…”
Section: Resultssupporting
confidence: 91%
“…Silicon nitride is another material that has been implemented as an EDL-inducing surface. 12,14,15 Both oxide and nitride thin films are common in microfabrication processes, where both films can be used as a͒ electronic insulators and passivators. Microfluidic channels based on the plasma-enhanced chemical vapor deposition ͑PECVD͒ of these films on planar substrates have recently been generated.…”
Section: Introductionmentioning
confidence: 99%
“…Y 2 O 3 satisfies the above mentioned requirements, and it is one of the additives studied extensively by several research groups. [42,43] Since, AlN powder is highly hydrolyzed in water, processing the AlN powder using the above mentioned methods is highly challenging. [33,34] However, chemical mixing has shown better homogenous mixing compared to the mechanical mixing.…”
Section: Homogeneous Dispersion Of Additivesmentioning
confidence: 99%