2006
DOI: 10.2109/jcersj.114.128
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Electrophoretic Deposition of Pb(Zr, Ti)O3 Powder on Si Wafer: Morphological Change Across Film Thickness

Abstract: PZT thick films were prepared using electrophoretic deposition EPD process with special emphasis placed on the powder packing behavior on silicon substrates. The suspending medium used was an ethanol solution containing an appropriate amount of HCl to introduce surface charges to the PbZr, TiO 3 particles, which were deposited on PtTiSiO 2 Si substrates under a constant electrical field. It was found that the deposited microstructure gradually changed across the film thickness: large particles were initially d… Show more

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Cited by 4 publications
(2 citation statements)
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“…After sintering selected layers at 1150°C, a homogeneous, dense PZT film with a thickness of 8 μm was reported. Kang et al . reported the processing of up to 17‐μm‐thick PZT films on silicon from ethanol‐based suspensions.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…After sintering selected layers at 1150°C, a homogeneous, dense PZT film with a thickness of 8 μm was reported. Kang et al . reported the processing of up to 17‐μm‐thick PZT films on silicon from ethanol‐based suspensions.…”
Section: Introductionmentioning
confidence: 99%
“…A more common approach is to prepare a suspension from PZT powder. Ma et al 20 and Kang et al 41 studied the deposition conditions for processing PZT thick films. They prepared 160 and 300 lm as-deposited PZT layers, respectively, from ethanolbased suspensions.…”
Section: Introductionmentioning
confidence: 99%