Electronic surface state of NiO (100)

Freitag, Andrea; Staemmler, Volker; Cappus, D.; Ventrice, Carl A.; Al‐Shamery, Katharina; Kuhlenbeck, Helmut; Freund, H.‐J.

doi:10.1016/0009-2614(93)89091-u

Cited by 108 publications

(81 citation statements)

References 19 publications

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“…[25] has been reported in both optical spectra [26,27] and in the spectra of electron energy loss spectroscopy (EELS) [22,25,28,29]. Like bulk transitions, the existence of (t 6 2g e 2 g ) → (t 5 2g e 3 g ) one-electron 3 B 1 → 3 E, 3 B 1 → 3 B 2 and 3 B 1 → 3 A 2 transitions and (t 6 2g e 2 g ) → (t 4 2g e 4 g ) two-electron 3 B 1 → 3 E transition for NiO have also been revealed by EELS spectra [23].…”

Section: Resultsmentioning

confidence: 99%

UV-Vis studies of 800 keV Ar ion irradiated NiO thin films

Mallick

Mishra

Kumar

et al. 2015

Materials Science-Poland

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We report the evolution of optical absorption properties of 800 keV Ar ion irradiated NiO thin films through UV-Vis characterization. Our results indicate the existence of both Mott-Hubbard (d → d transition) and charge-transfer (p → d transition) characteristic of NiO. The optical band gap of NiO increases from 3.58 to 3.75 eV when irradiated at the fluence of 5 × 10 14 ions cm −2 but it does not show any remarkable variation upon 800 keV Ar ion irradiation at higher fluences. The refractive index and electron polarizability at different ion fluences have been determined from the optical band gap. Both refractive index and electron polarizability follow an opposite trend to that of the energy gap as a function of ion fluence.

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Section: Resultsmentioning

confidence: 99%

UV-Vis studies of 800 keV Ar ion irradiated NiO thin films

Mallick

Mishra

Kumar

et al. 2015

Materials Science-Poland

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“…Fig. 4 shows the EL-spectra of a clean cleaved NiO(100) surface [12]. The assignment of the states is given in the figure.…”

Section: Surface States On Oxide Surfacesmentioning

confidence: 99%

“…2 illustrates the octahedral coordination in the bulk and compares it with the fivefold coordination in the surface layer. It is now quite obvious that we would have to look for ligand field effects [12]. Those will be most pronounced for the Ni ions with their unfilled d-shell.…”

Section: Surface States On Oxide Surfacesmentioning

confidence: 99%

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Metal Oxide Surfaces: Electronic Structure and Molecular Adsorption

Freund

1995

Physica Status Solidi (b)

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The surface science of oxides has received considerably less attention than the study of metal surfaces. We review some of our work on structural characterization and electronic structure investigations on oxide surfaces which we prepare as thin oxide films on metallic substrates. This preparation method leads to certain experimental advantages concerning the application of electron spectroscopies on such systems. We discuss molecular adsorption on non-polar and polar surfaces of clean oxides. The influence of metal deposition onto the oxide surfaces and on their properties with respect to adsorption is described. Light induced processes with full quantum state detection of desorbing molecules are addressed. The possibility of studying dynamic processes in adsorbates on oxides via electron spin resonance spectroscopy is evaluated.

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“…Its bulk antiferromagnetic nature lends itself to use in coupled layer magnetic storage media [38], [39] and [40] and the magnetic behavior of NiO nanoparticles is suitable for spin valves important in the rapidly developing fi eld of spintronics [41], [42], [43] and [44]. NiO surface properties have been well investigated [19], [45], [46], [47], [48], [49], [50], [51], [52], [53] and [54] and the band structure [55], [56], [57], [58], [59], [60] and [61] and crystallography of the ideal surface [62] and [63] are well-known. The NiO(1 0 0) cleavage plane [45], [62], [63] and [64] can produce, to within reasonable tolerances, well-ordered, stoichiometric substrates although cleaved surfaces have been reported to contain randomly-spaced step defects, approximately 25-100 nm apart, with the step heights in multiples of 2.1 Å, the Ni-O nearest-neighbor distance [52] and [54].…”

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Novel mesoscale defect structure on NiO(100) surfaces by atomic force microscopy

2006

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Part of the Chemistry CommonsThis Article is brought to you for free and open access by the Published Research -Department of Chemistry at DigitalCommons@University of Nebraska -Lincoln. It has been accepted for inclusion in Marjorie A. Langell Publications by an authorized administrator of DigitalCommons@University of Nebraska -Lincoln.Petitto, S. C.; Berrie, Cindy L.; and Langell, Marjorie , "Novel mesoscale defect structure on NiO(1 0 0) surfaces by atomic force microscopy" (2006). Marjorie A. Langell Publications. 12.

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Electronic surface state of NiO (100)

Cited by 108 publications

References 19 publications

UV-Vis studies of 800 keV Ar ion irradiated NiO thin films

UV-Vis studies of 800 keV Ar ion irradiated NiO thin films

Metal Oxide Surfaces: Electronic Structure and Molecular Adsorption

Novel mesoscale defect structure on NiO(100) surfaces by atomic force microscopy

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