Abstract:Using a full-potential method of attaching plane waves, the electronic structure of Al 2 O 3 is calculated in a corundum structure in the bulk and on the surface (0001). It is shown that the calculations consistently reproduce the properties with respect to the experiment. The effect of surface relaxation on the structure of subsurface states is discussed.
“…The O 2p electrons have a band width of about 7.1 eV, larger than that (6.4 eV) of N 2p, as shown in table 1. Those results agree well with the former theoretical calculations for α-Al 2 O 3 [8,[11][12][13] and for AlN [32][33][34]. Before discussing band gaps it is important to realize that calculations based on the density-functional theory (DFT) underestimate band gaps typically by 30% for the systems considered here [35].…”
supporting
confidence: 88%
“…Experiments show that α-Al 2 O 3 is a wide-gap insulator with a direct energy gap of about 8.3 eV at [8,9], larger than that of AlN (6.3 eV) [10]. Many theoretical calculations have been performed for α-Al 2 O 3 [8,[11][12][13][14][15][16]. The O-Al bonds in the compound exhibit highly ionic nature [13,17].…”
mentioning
confidence: 99%
“…The valence band (VB) is well separated into two parts, with the lower part consisting of O 2s states and the upper part being dominated by O 2p states. The lower part of the conduction band (CB) is in general believed to be dominated by Al 3s states [8,[11][12][13][14][15][16][17].…”
The nature of electron states in AlN and alpha-Al2O3Fang, C. M.; de Groot, R. A. Take-down policy If you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim.Downloaded from the University of Groningen/UMCG research database (Pure): http://www.rug.nl/research/portal. For technical reasons the number of authors shown on this cover page is limited to 10 maximum. Abstract Both α-alumina and aluminium nitride are insulators. They are widely applied as tunnel barriers. On the basis of first-principles calculations, it is shown here that the conduction band of these two compounds is of fundamentally different origin than generally assumed. The bottom of the conduction band of both compounds is primarily derived from oxygen/nitrogen 3s states with an admixture of a small amount of aluminium s character only. The presence of the anion 3s states is of importance for the size of the band gap: without them they would be significantly larger. The consequences of these differences are discussed.
“…The O 2p electrons have a band width of about 7.1 eV, larger than that (6.4 eV) of N 2p, as shown in table 1. Those results agree well with the former theoretical calculations for α-Al 2 O 3 [8,[11][12][13] and for AlN [32][33][34]. Before discussing band gaps it is important to realize that calculations based on the density-functional theory (DFT) underestimate band gaps typically by 30% for the systems considered here [35].…”
supporting
confidence: 88%
“…Experiments show that α-Al 2 O 3 is a wide-gap insulator with a direct energy gap of about 8.3 eV at [8,9], larger than that of AlN (6.3 eV) [10]. Many theoretical calculations have been performed for α-Al 2 O 3 [8,[11][12][13][14][15][16]. The O-Al bonds in the compound exhibit highly ionic nature [13,17].…”
mentioning
confidence: 99%
“…The valence band (VB) is well separated into two parts, with the lower part consisting of O 2s states and the upper part being dominated by O 2p states. The lower part of the conduction band (CB) is in general believed to be dominated by Al 3s states [8,[11][12][13][14][15][16][17].…”
The nature of electron states in AlN and alpha-Al2O3Fang, C. M.; de Groot, R. A. Take-down policy If you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim.Downloaded from the University of Groningen/UMCG research database (Pure): http://www.rug.nl/research/portal. For technical reasons the number of authors shown on this cover page is limited to 10 maximum. Abstract Both α-alumina and aluminium nitride are insulators. They are widely applied as tunnel barriers. On the basis of first-principles calculations, it is shown here that the conduction band of these two compounds is of fundamentally different origin than generally assumed. The bottom of the conduction band of both compounds is primarily derived from oxygen/nitrogen 3s states with an admixture of a small amount of aluminium s character only. The presence of the anion 3s states is of importance for the size of the band gap: without them they would be significantly larger. The consequences of these differences are discussed.
“…1. By analogy with [24], to describe the (0001) surface, an 18-layer film with two surfaces consisting of 12 aluminum and 6 oxygen layers was used. In computations, seven atomic layers on each surface side were optimized, and the atoms of other layers were fixed with interlayer distances typical of the bulk material.…”
538.971Theoretical investigations of adsorption of 3d-metals from Ti to Cu on the α-Al 2 O 3 (0001) surface are presented. The influence of adsorbates on the atomic and electronic structure of the aluminum oxide surface is considered. Values of the adsorption energy are calculated, and the equilibrium adatom positions on the surface are determined. A comparative analysis of the properties and mechanisms of 3d-metal interaction with atoms of the substrate is performed.
“…We note that the details of the calculation of the sur face electronic structure of aluminum oxide and anal ysis of its measurements compared to the bulk material were presented in [30]. Although the approximation used for the exchange-correlation functional, as well as the LDA, does not underestimate the width of the band gap of aluminum oxide, our calculations, as well as previous investigations, make it possible to hope that this circumstance only slightly affects the physical picture of phenomena studied in this work.…”
Ab initio calculations of the atomic and electronic structures of Me(111)/α Al 2 O 3 (0001) inter faces (Me = V, Cr, Nb, Mo, Ta, W) in the framework of density functional theory are reported. The energies of separation of metal films from oxide surfaces have been calculated. The structural and electronic factors responsible for the strong adhesion of bcc metal films on the oxygen termination of the surface of aluminum oxide have been analyzed.
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