1993
DOI: 10.1103/physrevb.47.6981
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Electronic structure of amorphousSiOx:H alloy films studied by x-ray emission spectroscopy: SiK, SiL, and OKemission bands

Abstract: We present x-ray Si K, Si L, and 0 I( emission bands of hydrogenated amorphous SiO"alloy films covering the concentration range 0 & x~2.2. All spectral features in the emission bands were identified and attributed to Si 3s, Si 3p, and 0 2s, 2p derived states. With increasing x, the shape and the energy position of the main features of the Si E and Si L emission bands change significantly, particularly in the concentration interval 0.5 &x &1.5. A comparison with available ultraviolet (UPS) and x-ray (XPS) photo… Show more

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Cited by 50 publications
(23 citation statements)
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“…1͒ shows a two-peaked structure similar to SiO 2 . 27 This is expected because the silicon atoms in a siloxane threedimensional gel are coordinated by two oxygen and one hydroxide side groups via oxygen atoms, and therefore one would expect a dominant silicon-oxygen bonding emission spectrum. Figure 3 and Tables I-III present a comparison of the experimental and calculated XPS valence band ͑VB͒ and XES spectra of PTES.…”
Section: A Electronic Structure and Chemical Bonding Of Unirradiatedmentioning
confidence: 99%
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“…1͒ shows a two-peaked structure similar to SiO 2 . 27 This is expected because the silicon atoms in a siloxane threedimensional gel are coordinated by two oxygen and one hydroxide side groups via oxygen atoms, and therefore one would expect a dominant silicon-oxygen bonding emission spectrum. Figure 3 and Tables I-III present a comparison of the experimental and calculated XPS valence band ͑VB͒ and XES spectra of PTES.…”
Section: A Electronic Structure and Chemical Bonding Of Unirradiatedmentioning
confidence: 99%
“…Therefore we have observed the same calculation problems with our Si L II,III XES that have been observed in other silicon-oxygen systems. 27 …”
Section: A Electronic Structure and Chemical Bonding Of Unirradiatedmentioning
confidence: 99%
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“…of ZnO detected in second order͒. [5][6][7] The effective attenuation lengths ͑ ‫ء‬ ͒ for the Si L 2,3 and O K emission roughly correspond to 0.5 and four times the Si layer thickness, respectively. 8 Hence, the Si L 2,3 spectra are dominated by the near-surface material properties of the Si layer and the O K measurements primarily probe the chemical structure of the TCO bulk.…”
Section: ͑͒mentioning
confidence: 99%
“…Analysis of obtained data shows that the surface layer of original por-Si mainly involves crystalline, amorphous and rather strongly disordered silicon, represented by the reference phases c-Si, a-Si, Si:Ar and low-coordinated silicon as well as the oxides SiO 1.3 , SiO 1.7 и SiO 2 [20]. During deposition of metals into porous silicon iron and cobalt interact in a different way with porous silicon.…”
mentioning
confidence: 95%