2009
DOI: 10.1063/1.3238466
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Electronic properties of ZnO field-effect transistors fabricated by spray pyrolysis in ambient air

Abstract: We report the application of spray pyrolysis (SP) for the deposition of high quality zinc oxide (ZnO) films and the fabrication of thin-film transistors. The chemical, structural, optical, and electronic properties of as-deposited ZnO films are studied using infrared spectroscopy, atomic force microscopy, UV-visible spectroscopic ellipsometry, and field-effect measurements. SP ZnO films are found to be uniform and polycrystalline with a band gap of 3.32 eV. ZnO transistors exhibit n-channel characteristics wit… Show more

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Cited by 69 publications
(54 citation statements)
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“…These properties, as well as the relative ease with which ZnO nanostructures can be grown, lend themselves to use in nanoscale field effect transistors, 1 antireflection coatings, 2 energy-harvesting, [3][4][5] and optoelectronic 6,7 devices. ZnO nanorods can be synthesised at low-temperatures (<100 C) using aqueous chemical growth from a variety of chemical precursor mixtures such as zinc nitrate hexahydrate (Zn(NO) 3 Á6H 2 O) and hexamethylenetetramine (HMT).…”
Section: Introductionmentioning
confidence: 99%
“…These properties, as well as the relative ease with which ZnO nanostructures can be grown, lend themselves to use in nanoscale field effect transistors, 1 antireflection coatings, 2 energy-harvesting, [3][4][5] and optoelectronic 6,7 devices. ZnO nanorods can be synthesised at low-temperatures (<100 C) using aqueous chemical growth from a variety of chemical precursor mixtures such as zinc nitrate hexahydrate (Zn(NO) 3 Á6H 2 O) and hexamethylenetetramine (HMT).…”
Section: Introductionmentioning
confidence: 99%
“…[35][36][37][38][39] Here we demonstrate how spray pyrolysis (SP), a simple and large-area-compatible deposition technique, can be used for the processing of high-quality ZrO 2 layers onto glass substrates containing prepatterned indium tin oxide (ITO) electrodes. We demonstrate their use in high-mobility, low-voltage TFTs based on either ZnO or Li-doped ZnO fi lms deposited by SP [10][11][12][13][14] directly onto ITO/ZrO 2 . Optimised TFTs based on ITO/ZrO 2 / Li-ZnO multilayer structures deposited sequentially at substrate temperatures of 400-450 ° C exhibit excellent electrontransport characteristics with operating voltages below 6 V and a maximum electron mobility on the order of 85 cm 2 V − 1 s − 1 .…”
mentioning
confidence: 99%
“…For example, metal oxides such as zinc oxide (ZnO) [17][18][19][20][21][22] , indium oxide (In 2 O 3 ) [23][24] , indium gallium oxide (InGaO) [25] , indium zinc oxide (InZnO) [18][19][20][21][22][23][24][25][26] and zinc tin oxide (ZnSnO) [27] have been synthesised using soluble precursors and implemented into TFT structures. Despite the process simplicity, excellent charge carrier mobilities have been achieved, clearly demonstrating the significant potential of this alternative processing methodology.…”
mentioning
confidence: 99%
“…[28] One interesting observation is that short channel (<30 µm) Li-ZnO TFTs show higher electron mobilities as compared to long channel devices (>20 µm). The effect is attributed to grain boundary limited electron transport [21,29] . This effect is better illustrated in Figure 2c where the saturated electron mobility, obtained from a number (e.g.…”
mentioning
confidence: 99%
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